⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL177481 | 0.67 | — | — | |
| SCHEMBL1255601 | 0.67 | — | — | |
| SCHEMBL9148848 | 0.63 | — | — | |
| SCHEMBL18131679 | 0.63 | — | — | |
| SCHEMBL2734160 | 0.60 | — | — | |
| SCHEMBL23296276 | 0.55 | — | — | |
| SCHEMBL378743 | 0.55 | — | — | |
| SCHEMBL155219 | 0.55 | — | — | |
| SCHEMBL703656 | 0.55 | — | — | |
| SCHEMBL3489090 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4748968-A1 | METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS | Hansol Chemical Co., Ltd (KR) | 2026-05-27 | — | — | EP | claimed |
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | claimed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | claimed |
| US-11784026-B2 | Substrate processing apparatus, material layer deposition apparatus, and atmospheric pressure chemical vapor deposition apparatus | SAMSUNG ELECTRONICS CO., LTD. | 2023-10-10 | — | — | US | claimed |
| US-20210222300-A1 | SUBSTRATE PROCESSING APPARATUS, MATERIAL LAYER DEPOSITION APPARATUS, AND ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-07-22 | — | — | US | claimed |
| CN-105820580-A | High-strength silicone rubber electromagnetic shielding material and preparing method thereof | 东莞市联洲知识产权运营管理有限公司 | 2016-08-03 | — | — | CN | claimed |
| EP-4748968-A1 | METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS | Hansol Chemical Co., Ltd (KR) | 2026-05-27 | — | — | EP | disclosed |
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | disclosed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | disclosed |
| US-20250158027-A1 | NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR PREPARING THE SAME, AND SECONDARY BATTERY AND ELECTRICAL DEVICE COMPRISING THE SAME | CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) | 2025-05-15 | — | — | US | disclosed |
| EP-4517870-A1 | NEGATIVE ELECTRODE ACTIVE MATERIAL AND PREPARATION METHOD THEREFOR, AND SECONDARY BATTERY AND ELECTRICAL DEVICE CONTAINING NEGATIVE ELECTRODE ACTIVE MATERIAL | Contemporary Amperex Technology (Hong Kong) Limited (HK) | 2025-03-05 | — | — | EP | disclosed |
| CN-118540936-A | Semiconductor device and method for manufacturing the same | 三星电子株式会社 | 2024-08-23 | — | — | CN | disclosed |
| US-20240284658-A1 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-08-22 | — | — | US | disclosed |
| EP-0475666-B1 | Method of Manufacturing an Amorphous Silicon Solar Cell | MITSUI TOATSU CHEMICALS (JP) | 1997-04-09 | — | — | EP | disclosed |
| US-5248348-A | AMORPHOUS SILICON SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1993-09-28 | — | — | US | disclosed |
| US-5194398-A | SEMICONDUCTOR FILM AND PROCESS FOR ITS PRODUCTION | MITSUI TOATSU CHEMICALS, INC. (JP) | 1993-03-16 | — | — | US | disclosed |
| EP-0475666-A2 | Method of Manufacturing an Amorphous Silicon Solar Cell | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1992-03-18 | — | — | EP | disclosed |
| EP-0407088-A1 | Amorphous semiconductor film and process for its production | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1991-01-09 | — | — | EP | disclosed |
| EP-0296702-A2 | Method of forming semiconducting amorphous silicon films from the thermal decompositon of fluorohydridodisilanes | DOW CORNING CORPORATION (US) | 1988-12-28 | — | — | EP | disclosed |
| US-4762808-A | Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes | DOW CORNING CORPORATION (US) | 1988-08-09 | — | — | US | disclosed |