SCHEMBL177481

SCHEMBL177481

F[SiH2]F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2734160 0.89
SCHEMBL1255601 0.75
SCHEMBL8587258 0.67
SCHEMBL378743 0.61
SCHEMBL155219 0.61
SCHEMBL23296276 0.61
SCHEMBL703656 0.61
SCHEMBL378744 0.61
SCHEMBL3489090 0.61
SCHEMBL5682782 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1005 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP claimed
US-20260011722-A1 Production Process for a Porous Host Structure Containing Silicon Oxide as an Anode Active Material for a Lithium Battery HONEYCOMB BATTERY COMPANY (US) 2026-01-08 US claimed
US-12513952-B2 Method for fabricating a semiconductor device including etching nanostructures Taiwan Semiconducor Manufacturing Company, Ltd. (TW) 2025-12-30 US claimed
EP-4667616-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR Hansol Chemical Co., Ltd (KR) 2025-12-24 EP claimed
US-12492122-B2 Process for producing and regenerating hydrogen carrier compounds HYSILABS, SAS (FR) 2025-12-09 US claimed
US-20250369114-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR HANSOL CHEMICAL CO LTD (KR) 2025-12-04 US claimed
US-12463041-B2 Method and apparatus for forming ruthenium silicide film on surface of substrate TOKYO ELECTRON LIMITED (JP) 2025-11-04 US claimed
EP-3876904-B1 ORAL MUCOSAL CARRIER AND PROTECTANT INSPIRED MAT STRATEGIES LLC (US) 2025-08-20 EP claimed
EP-4585715-A1 COMPOSITION FOR DEPOSITING A MOLYBDENUM-CONTAINING THIN FILM, METHOD FOR MANUFACTURING A MOLYBDENUM-CONTAINING THIN FILM, AND MOLYBDENUM-CONTAINING THIN FILM MANUFACTURED THEREBY Samsung Electronics Co., Ltd. (KR) 2025-07-16 EP claimed
US-20250179627-A1 COMPOSITION FOR DEPOSITING A MOLYBDENUM-CONTAINING THIN FILM, METHOD FOR MANUFACTURING A MOLYBDENUM-CONTAINING THIN FILM, AND MOLYBDENUM-CONTAINING THIN FILM MANUFACTURED THEREBY DNF CO., LTD. (KR) 2025-06-05 US claimed
EP-0262980-B1 METHOD OF FORMING SEMICONDUCTING AMORPHOUS SILICON FILMS FROM THE THERMAL DECOMPOSITION OF DIHALOSILANES DOW CORNING CORPORATION (US) 1992-11-11 EP claimed
US-5082696-A Stable, wear resistant, photoconductive DOW CORNING CORPORATION (US) 1992-01-21 US claimed
EP-0334791-A1 Process for the preparation of silicon nitride UNION EXPLOSIVOS RIO TINTO, S.A. (ES) 1989-09-27 EP claimed
US-4748131-A Method for increasing radiation hardness of MOS gate oxides THE AEROSPACE CORPORATION (US) 1988-05-31 US claimed
EP-0262980-A2 Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes DOW CORNING CORPORATION (US) 1988-04-06 EP claimed
US-4693927-A MULTILAYER PROTECTIVE FILM FORMED BY PLASMA POLYMERIZATION COVERING THIN MAGNETIC METAL FILM ON SUPPORT; SCRATCH, WEATHER AND ABRASION RESISTANT FUJI PHOTO FILM COMPANY LIMITED (JP) 1987-09-15 US claimed
US-4402867-A Silica-modified zeolite catalysts MOBIL OIL CORPORATION (US) 1983-09-06 US claimed
US-4138509-A Silicon purification process MOTOROLA, INC. (US) 1979-02-06 US claimed
US-4070444-A Low cost, high volume silicon purification process MOTOROLA INC. (US) 1978-01-24 US claimed
US-3969163-A Vapor deposition method of forming low cost semiconductor solar cells including reconstitution of the reacted gases TEXAS INSTRUMENTS INCORPORATED (US) 1976-07-13 US claimed