Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25780531 | 0.89 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL15836464 | 0.87 | TSHR (0.33) | TSHRALDH1A1 | |
| SCHEMBL20103327 | 0.86 | — | — | |
| SCHEMBL13006208 | 0.81 | TSHR (0.36) | TSHRALDH1A1 | |
| SCHEMBL10065737 | 0.81 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL86023 | 0.81 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL75248 | 0.80 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL25962728 | 0.79 | TSHR (0.33) | TSHRALDH1A1 | |
| SCHEMBL13467556 | 0.79 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL16866886 | 0.78 | TSHR (0.35) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10481495-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-19 | — | — | US | disclosed |
| US-20190243246-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-08-08 | — | — | US | disclosed |
| US-10241411-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-03-26 | — | — | US | disclosed |
| US-10042259-B2 | Topcoat compositions and pattern-forming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-08-07 | — | — | US | disclosed |
| US-20180118968-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-05-03 | — | — | US | disclosed |
| US-20180118970-A1 | TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2018-05-03 | — | — | US | disclosed |
| US-9448486-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-20 | — | — | US | disclosed |
| US-9448486-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-20 | — | — | US | disclosed |
| US-20160130462-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM & HAAS ELECT MAT (US) | 2016-05-12 | — | — | US | disclosed |
| US-20160130462-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM & HAAS ELECT MAT (US) | 2016-05-12 | — | — | US | disclosed |
| US-9063425-B2 | Topcoat compositions and photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC. (US) | 2015-06-23 | — | — | US | disclosed |
| US-9063425-B2 | Topcoat compositions and photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC. (US) | 2015-06-23 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| EP-2511766-B1 | Topcoat compositions for photoresist and immersion photolithography process using them | ROHM & HAAS ELECT MAT (US) | 2013-07-31 | — | — | EP | disclosed |
| US-20130115553-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-05-09 | — | — | US | disclosed |
| US-20130115553-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-05-09 | — | — | US | disclosed |
| US-20120264053-A1 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-10-18 | — | — | US | disclosed |
| EP-2511766-A1 | Topcoat compositions for photoresist and immersion photolithography process using them | Rohm and Haas Electronic Materials LLC (US) | 2012-10-17 | — | — | EP | disclosed |
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |