Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3757201 | 0.88 | — | — | |
| SCHEMBL15000216 | 0.86 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL13263776 | 0.85 | — | — | |
| SCHEMBL22336636 | 0.85 | — | — | |
| SCHEMBL239432 | 0.85 | — | — | |
| SCHEMBL9610671 | 0.85 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL13006208 | 0.84 | TSHR (0.36) | TSHRALDH1A1THRB | |
| SCHEMBL25561465 | 0.84 | TSHR (0.40) | TSHRALDH1A1THRB | |
| SCHEMBL6849319 | 0.84 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL86023 | 0.83 | TSHR (0.37) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 856 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114835387-A | Glass toughening treatment process | 淄博泰康轻工制品有限公司 | 2022-08-02 | — | — | CN | claimed |
| CN-114751656-A | Tempered glass and preparation method thereof | 淄博泰康轻工制品有限公司 | 2022-07-15 | — | — | CN | claimed |
| CN-114637165-A | Composition for top coating of photoresist and preparation method of polymer of composition | 中节能万润股份有限公司 | 2022-06-17 | — | — | CN | claimed |
| CN-114349898-A | Polymer for 193nm immersed photoresist top coating, preparation method and application | 苏州润邦半导体材料科技有限公司 | 2022-04-15 | — | — | CN | claimed |
| US-9233840-B2 | Method for improving self-assembled polymer features | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-12 | — | — | US | claimed |
| US-8486489-B2 | Methods for aligning polymer films and related structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-16 | — | — | US | claimed |
| US-20120103935-A1 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES | JSR CORPORATION (JP) | 2012-05-03 | — | — | US | claimed |
| US-7906031-B2 | Aligning polymer films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-15 | — | — | US | claimed |
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | claimed |
| US-20090212016-A1 | Aligning polymer films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-08-27 | — | — | US | claimed |
| US-20090214823-A1 | METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-08-27 | — | — | US | claimed |
| US-7135595-B2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-11-14 | — | — | US | claimed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| CN-114835387-B | Glass tempering treatment process | 佛山市顺德区康仕玻璃五金工艺有限公司 | 2025-01-21 | — | — | CN | disclosed |
| US-20240427248-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2024-12-26 | — | — | US | disclosed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | disclosed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | disclosed |