⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL85922 | 0.99 | — | — | |
| SCHEMBL21122756 | 0.87 | EPHX1 (0.32) | — | |
| SCHEMBL75368 | 0.80 | PDK1 (0.39) | — | |
| SCHEMBL23501493 | 0.79 | EPHX1 (0.33) | — | |
| SCHEMBL14336917 | 0.79 | — | — | |
| SCHEMBL776348 | 0.79 | PDK1 (0.38) | — | |
| SCHEMBL75130 | 0.78 | PDK1 (0.36) | — | |
| SCHEMBL85911 | 0.77 | TSHR (0.40) | — | |
| SCHEMBL85655 | 0.77 | — | — | |
| SCHEMBL9610643 | 0.77 | PDK1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-7312288-B2 | Polymerizable fluorinated ester compounds and their preparing processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-7312288-B2 | Polymerizable fluorinated ester compounds and their preparing processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-7312288-B2 | Polymerizable fluorinated ester compounds and their preparing processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20070249858-A1 | POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-25 | — | — | US | disclosed |
| US-20070249858-A1 | POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-25 | — | — | US | disclosed |
| US-20070249858-A1 | POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-25 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |