SCHEMBL859591

SCHEMBL859591

COc1ccc(C(=O)c2ccccc2)cc1S(=O)(=O)O

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.64
LMNA P02545 4/20 0.64
MAPT P10636 4/20 0.64
KMT2A Q03164 1/20 0.64
CYP1A2 P05177 2/20 0.61
CYP2C19 P33261 2/20 0.61
HPGD P15428 2/20 0.61
CYP2D6 P10635 1/20 0.61
PTGS1 P23219 1/20 0.56
PTGS2 P35354 1/20 0.56
PKM P14618 1/20 0.54
CYP3A4 P08684 2/20 0.53
CYP2C9 P11712 1/20 0.53
TSHR P16473 1/20 0.53
GAA P10253 1/20 0.50
BCHE P06276 2/20 0.49
ACHE P22303 2/20 0.49
NPSR1 Q6W5P4 1/20 0.49
L3MBTL1 Q9Y468 2/20 0.49
HTT P42858 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7092756 0.88 ALDH1A1 (0.53) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL12277318 0.88 GAA (0.54) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL12277305 0.88 GAA (0.54) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL8958949 0.87 ALDH1A1 (0.55) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL28270536 0.85 CYP1A2 (0.58) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL6367984 0.85 CYP1A2 (0.58) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL15110942 0.84 CYP1A2 (0.49) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL15110944 0.84 TSHR (0.49) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL10430096 0.82 ALDH1A1 (0.48) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL27568955 0.82 ALDH1A1 (0.48) ALDH1A1LMNAMAPTKMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110396332-A A kind of the protection coating solution and wafer slice processing method of wafer laser cutting SHENZHEN TEYAN SEMICONDUCTOR EQUIPMENT CO LTD 2019-11-01 CN disclosed
CN-110177842-A Containing powder composition and its manufacturing method and cosmetics 株式会社资生堂 2019-08-27 CN disclosed
CN-110049753-A Oil-in-water type composition 株式会社资生堂 2019-07-23 CN disclosed
CN-109890353-A Cosmetic composition 株式会社资生堂 2019-06-14 CN disclosed
CN-106794134-B The preparation method of α gels midbody composite and the O/W emulsification cosmetics containing α gels of use the composition 株式会社资生堂 2018-07-10 CN disclosed
CN-106794134-A The preparation method of α gels midbody composite and the O/W emulsification cosmetics containing α gels using said composition 株式会社资生堂 2017-05-31 CN disclosed
CN-103717199-B Water-in-oil emulsified cosmetic 株式会社资生堂 2017-04-19 CN disclosed
CN-106562891-A Multifunctional anti-aging face application agent composition 李志林 2017-04-19 CN disclosed
CN-106561081-A Water-in-oil type emulsified solid cosmetic 株式会社资生堂 2017-04-12 CN disclosed
CN-105848631-A Stick-shaped base material containing lipid peptide type compound 日产化学工业株式会社 2016-08-10 CN disclosed
US-7157206-B2 Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
US-7157206-B2 Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
CN-1852697-A Use of halogenated hydroxydiphenyl ether compounds for the treatment of the skin CIBA SC HOLDING AG (CH) 2006-10-25 CN disclosed
US-20060204887-A1 including supports, recording layer comprising alkali-soluble polysulfonamides, and light to heat conversion dyes, capable of forming image upon irradiation with infrared radiation; printing durability and chemical resistance FUJI PHOTO FILM CO., LTD. 2006-09-14 US disclosed
WO-2006095911-A1 ENCAPSULATION MATERIAL FOR SOLAR CELL ELEMENT DU PONT-MITSUI POLYCHEMICALS CO., LTD. (JP) 2006-09-14 WO disclosed
EP-0826542-B1 Removable window film for motor vehicles LINTEC CORP (JP) 2002-12-18 EP disclosed
EP-0721484-A1 ULTRAVIOLET SHIELDING COMPOSITE FINE PARTICLES, METHOD FOR PRODUCING THE SAME, AND COSMETICS Kao Corporation (JP) 1996-07-17 EP disclosed
WO-1995009895-A1 ULTRAVIOLET SHIELDING COMPOSITE FINE PARTICLES, METHOD FOR PRODUCING THE SAME, AND COSMETICS KAO CORPORATION (JP) 1995-04-13 WO disclosed
EP-0339994-A2 Detergent composition in gel form UNILEVER PLC (GB) 1989-11-02 EP disclosed
US-4171974-A Aqueous alkali developable negative working lithographic printing plates POLYCHROME CORPORATION (US) 1979-10-23 US disclosed