SCHEMBL8597698

SCHEMBL8597698

C[Si](C)(Cl)N[Si](C)(C)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12401592 0.82
SCHEMBL28548869 0.76
SCHEMBL2100842 0.70
SCHEMBL30519219 0.70
SCHEMBL26618236 0.70
SCHEMBL28628072 0.67
SCHEMBL3764421 0.67 ALDH1A1 (0.55)
SCHEMBL1319 0.65
SCHEMBL17331 0.65
SCHEMBL15658212 0.65 ALDH1A1 (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0654544-B1 Process for lining a chemical reactor with silicon-based ceramic materials by thermal decomposition of silazane precursors ENICHEM SPA (IT) 1998-01-28 EP claimed
EP-0671483-B1 Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors ENICHEM SPA (IT) 1997-12-29 EP claimed
CN-112300208-B Preparation method of cyclodisilazane 中国科学院化学研究所 2022-03-01 CN disclosed
CN-112300208-A Preparation method of cyclodisilazane 中国科学院化学研究所 2021-02-02 CN disclosed
CN-106317101-B A kind of method of non high temperature exchange process synthesis 1,3- bis- (diphenyl chlorosilane base) -2,2,4,4- tetramethyl-ring disilazane 中国科学院化学研究所 2019-01-22 CN disclosed
CN-106317102-B A kind of synthetic method of bis- (diphenyl chlorosilane base) -2,2,4,4- tetramethyl-ring disilazanes of 1,3- 中国科学院化学研究所 2018-07-13 CN disclosed
CN-106317101-A Method for synthesizing 1,3-di(diphenylchlorosilyl)-2,2,4,4-tetramethylcyclodisilazane by non-high-temperature exchange process 中国科学院化学研究所 2017-01-11 CN disclosed
EP-0654544-B1 Process for lining a chemical reactor with silicon-based ceramic materials by thermal decomposition of silazane precursors ENICHEM SPA (IT) 1998-01-28 EP disclosed
US-5616754-A ORGANO DISILAZANE OR TRISILAZANE CHEMICAL INTERMEDIATES ENICHEM S.P.A. (IT) 1997-04-01 US disclosed
EP-0654544-A2 Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials ENICHEM S.p.A. (IT) 1995-05-24 EP disclosed
US-5413813-A Pyrolysis of compounds to form ceramics ENICHEM S.P.A. (IT) 1995-05-09 US disclosed