SCHEMBL86031

SCHEMBL86031

C=C(C)C(=O)OC(C(C)C)C(F)(F)C(O)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.34
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6131295 0.84 TSHR (0.39) TSHRALDH1A1
SCHEMBL85647 0.83 TSHR (0.36) TSHRALDH1A1
SCHEMBL14336900 0.78 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL795471 0.76 TSHR (0.42) TSHRALDH1A1
SCHEMBL892311 0.76 TSHR (0.36) TSHRALDH1A1
SCHEMBL75378 0.76 TSHR (0.36) TSHRALDH1A1
SCHEMBL5334135 0.75 TSHR (0.33) TSHRALDH1A1
SCHEMBL9610660 0.75 TSHR (0.35) TSHRALDH1A1
SCHEMBL9821090 0.74 ALDH1A1 (0.39) TSHRALDH1A1
SCHEMBL891787 0.73 ALDH1A1 (0.41) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-8129099-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20090208886-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed