Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15836495 | 0.91 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL7803921 | 0.87 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL3182460 | 0.85 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL16409373 | 0.84 | — | — | |
| SCHEMBL20276190 | 0.82 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL86349 | 0.82 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL8383943 | 0.82 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL15836508 | 0.82 | ALDH1A1 (0.32) | ALDH1A1TSHR | |
| SCHEMBL3134330 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL145853 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11130855-B2 | Composition for forming release layer, and release layer | NISSAN CHEMICAL CORPORATION (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20200239679-A1 | COMPOSITION FOR FORMING RELEASE LAYER, AND RELEASE LAYER | NISSAN CHEMICAL CORPORATION (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-110945078-A | Composition for forming release layer and release layer | 日产化学株式会社 | 2020-03-31 | — | — | CN | disclosed |
| US-9842993-B2 | Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-12-12 | — | — | US | disclosed |
| US-9842993-B2 | Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-12-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160181531-A1 | Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-06-23 | — | — | US | disclosed |
| US-8105747-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20100075249-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100075249-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100075249-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100069590-A1 | COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100069590-A1 | COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100069590-A1 | COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100069590-A1 | COMPOUND AND POLYMERIC COMPOUND | AFF1, F12, AFF4 | ALDH1A1 936/4885TSHR 1409/4885THRB 3925/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.