SCHEMBL8614727

SCHEMBL8614727

Oc1ccc2ccc(O)cc2c1.Oc1ccc2cccc(O)c2c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.58
CTDSP1 Q9GZU7 1/20 0.57
ESR2 Q92731 8/20 0.52
ESR1 P03372 7/20 0.52
MCL1 Q07820 1/20 0.52
HSD17B1 P14061 4/20 0.48
HSD17B2 P37059 4/20 0.48
CYP3A4 P08684 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2B6 P20813 1/20 0.44
CYP2C19 P33261 1/20 0.44
HTR5A P47898 1/20 0.44
CLK1 P49759 1/20 0.43
DYRK1A Q13627 1/20 0.43
DYRK1B Q9Y463 1/20 0.43
GRIN2D O15399 1/20 0.43
GRIN2A Q12879 1/20 0.43
GRIN2B Q13224 1/20 0.43
GRIN2C Q14957 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL27750041 0.94 CYP1A2 (0.60) CYP1A2CTDSP1ESR2ESR1MCL1
SCHEMBL29352754 0.94 CTDSP1 (0.63) CYP1A2CTDSP1ESR2ESR1MCL1
SCHEMBL29738648 0.94 CTDSP1 (0.63) CYP1A2CTDSP1ESR2ESR1MCL1
SCHEMBL29616 0.94 CTDSP1 (0.63) CYP1A2CTDSP1ESR2ESR1MCL1
Hydrogen Sulfide SCHEMBL8466036 0.91 CTDSP1 (0.61) CYP1A2CTDSP1ESR2ESR1MCL1
SCHEMBL8675127 0.90 HSD17B1 (0.61) CYP1A2CTDSP1ESR2ESR1MCL1
1-Naphthol SCHEMBL28321946 0.90 CYP1A2 (0.68) CYP1A2CTDSP1ESR2ESR1MCL1
SCHEMBL8061629 0.87 CYP1A2 (0.56) CYP1A2CTDSP1ESR2ESR1HSD17B1
SCHEMBL8570092 0.86 CYP1A2 (0.56) CYP1A2CTDSP1ESR2ESR1HSD17B1
SCHEMBL8008479 0.86 CYP1A2 (0.56) CYP1A2CTDSP1ESR2ESR1HSD17B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0610920-B1 Method of preparing naphthol-modified phenolic resin and epoxy resin molding material for sealing electronic parts HITACHI CHEMICAL CO LTD (JP) 1998-04-29 EP disclosed
US-4146532-A Fluoroelastomer composition with diazobicycloundecenium DAIKIN KOGYO CO., LTD. (JP) 1979-03-27 US disclosed