⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1094259 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL10932708 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL5690466 | 0.89 | — | — | |
| SCHEMBL11129426 | 0.87 | — | — | |
| SCHEMBL11419490 | 0.86 | — | — | |
| SCHEMBL9725576 | 0.83 | — | — | |
| SCHEMBL2194983 | 0.81 | — | — | |
| SCHEMBL28528361 | 0.76 | — | — | |
| SCHEMBL8887364 | 0.75 | TSHR (0.41) | — | |
| SCHEMBL28517139 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4273842-A | Process for forming patternwise coated powder layer | HITACHI, LTD. (JP) | 1981-06-16 | — | — | US | claimed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | claimed |
| US-5824717-A | ISOOLEFIN COPOLYMER WITH P-ALKYLSTYRENE; USED FOR HIGH PURITY RUBBER GOODS FOR BIOMEDICAL INDUSTRY AND MEDICAL DEVICES, HOSES, WIRE CABLE INSULATION, CONDENSER PACKING, PACKAGING AND FILMS FOR FOOD CONTACT | EXXON CHEMICAL PATENTS INC. (US) | 1998-10-20 | — | — | US | disclosed |
| EP-0609397-B1 | RADIATION CURABLE ISOOLEFIN COPOLYMERS | EXXON CHEMICAL PATENTS INC (US) | 1998-05-13 | — | — | EP | disclosed |
| US-5591551-A | UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications | EXXON CHEMICAL PATENTS INC. (US) | 1997-01-07 | — | — | US | disclosed |
| US-5587261-A | UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating | EXXON CHEMICAL PATENTS INC. (US) | 1996-12-24 | — | — | US | disclosed |
| WO-1996040800-A1 | PEROXIDE AND RADIATION CURABLE COMPOSITIONS CONTAINING ISOBUTYLENE COPOLYMERS HAVING ACRYLATE FUNCTIONALITY | EXXON CHEMICAL PATENTS INC. (US) | 1996-12-19 | — | — | WO | disclosed |
| US-5585416-A | ULTRAVIOLET OR ELECTRON BEAM CROSSLINKING; COPOLYMER OF ISOOLEFIN AND PARA-ALKYLSTYRENE | EXXON CHEMICAL PATENTS INC. (US) | 1996-12-17 | — | — | US | disclosed |
| US-5585225-A | P-ALKYLSTYRENE FUNCTIONALIZED WITH RADIATION REACTIVE GROUP TO IMPART RADIATION CURABILITY | EXXON CHEMICAL PATENTS INC. (US) | 1996-12-17 | — | — | US | disclosed |
| EP-0392235-B1 | Process for plating a metallic deposit between functional pattern lines on a substrate | NIPPON PAINT CO LTD (JP) | 1995-06-07 | — | — | EP | disclosed |
| US-5376503-A | A photo-crosslinkable blends consisting of an isoolefin, a para-alkylstyrene and a photoinitiator substituted on the alkyl group of para-alkylstyrene monomers; corrosion, solvent resistance | EXXON CHEMICAL PATENTS INC. (US) | 1994-12-27 | — | — | US | disclosed |
| US-4326020-A | Method of making positive acting diazo lithographic printing plate | POLYCHROME CORPORATION (US) | 1982-04-20 | — | — | US | disclosed |
| US-4273842-A | Process for forming patternwise coated powder layer | HITACHI, LTD. (JP) | 1981-06-16 | — | — | US | disclosed |
| US-4233390-A | WATER SOLUBLE DIAZO RESIN COATED WITH PHOTOPOLYMERIZABLE COMPOSITION | POLYCHROME CORPORATION (US) | 1980-11-11 | — | — | US | disclosed |
| US-4224397-A | Continuous tone diazo material | TRANS WORLD TECHNOLOGY LABORATORIES INC. (TWT LABS, INC.) (US) | 1980-09-23 | — | — | US | disclosed |
| US-4188215-A | Photosensitive printing plate, method of preparing same, and method of processing same | FUJI PHOTO FILM CO., LTD. (JP) | 1980-02-12 | — | — | US | disclosed |
| US-4148646-A | FOR MAKING DUPLICATES OF X-RAY FILMS | TRANS WORLD TECHNOLOGY LABORATORIES, INC. (US) | 1979-04-10 | — | — | US | disclosed |
| US-4126460-A | Light sensitive printing plate comprising a matted overlayer | FUJI PHOTO FILM CO., LTD. (JP) | 1978-11-21 | — | — | US | disclosed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | disclosed |
| US-3950171-A | THERMOPLASTIC RESIN DIAZONIUM SALT | MITA INDUSTRIAL CO. LTD. (JA) | 1976-04-13 | — | — | US | disclosed |