⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL10932708 | 0.98 | — | — | |
| Hydrochloric Acid SCHEMBL5690466 | 0.96 | — | — | |
| SCHEMBL11129426 | 0.94 | — | — | |
| SCHEMBL8616561 | 0.93 | — | — | |
| SCHEMBL9725576 | 0.89 | — | — | |
| SCHEMBL11419490 | 0.89 | — | — | |
| SCHEMBL3376101 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL6015225 | 0.76 | — | — | |
| SCHEMBL9638261 | 0.76 | — | — | |
| SCHEMBL11452968 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1132775-B1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | claimed |
| US-6593054-B2 | Comprises diazo resin, photopolymerizable resin, or photocrosslinkable resin; for increasing adhesion to aluminum substrate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-15 | — | — | US | claimed |
| US-20020064726-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORPORATION (JP) | 2002-05-30 | — | — | US | claimed |
| EP-1132775-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-12 | — | — | EP | claimed |
| US-5407777-A | Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(phenidone) as an anti-oxidant | FUJI PHOTO FILM CO., LTD. (JP) | 1995-04-18 | — | — | US | claimed |
| US-5080999-A | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide | FUJI PHOTO FILM CO., LTD. (JP) | 1992-01-14 | — | — | US | claimed |
| US-4777111-A | PHOTOLITHOGRAPHY MASKS | FAIRMOUNT CHEMICAL COMPANY, INC. (US) | 1988-10-11 | — | — | US | claimed |
| EP-0231207-A4 | CONTRAST ENHANCEMENT LAYER. | FAIRMOUNT CHEM (US) | 1988-02-16 | — | — | EP | claimed |
| EP-0231207-A1 | CONTRAST ENHANCEMENT LAYER | FAIRMOUNT CHEMICAL CO., INC. (US) | 1987-08-12 | — | — | EP | claimed |
| WO-1986007473-A1 | CONTRAST ENHANCEMENT LAYER | FAIRMOUNT CHEMICAL CO., INC. (US) | 1986-12-18 | — | — | WO | claimed |
| US-4486527-A | HEAT-FUSIBLE COLOR ASSISTANT | RICOH COMPANY, LTD. (JP) | 1984-12-04 | — | — | US | claimed |
| JP-57189132-A | — | — | None | — | — | JP | disclosed |
| JP-57185431-A | — | — | None | — | — | JP | disclosed |
| JP-57191094-A | — | — | None | — | — | JP | disclosed |
| JP-57204031-A | — | — | None | — | — | JP | disclosed |
| US-4284704-A | Photographic elements with incorporated hydrogen source photoreductant and tetrazolium salt | EASTMAN KODAK COMPANY (US) | 1981-08-18 | — | — | US | disclosed |
| US-RE30267-E | SEMIPERMEABLE MEMBRANE, THIN FILM | EASTMAN KODAK COMPANY (US) | 1980-05-06 | — | — | US | disclosed |
| US-4187424-A | Radioelectrophotography process | FUJI PHOTO FILM CO., LTD. (JP) | 1980-02-05 | — | — | US | disclosed |
| US-4066403-A | DECOMPOSITION, PERMEABLE BARRIERS | EASTMAN KODAK COMPANY (US) | 1978-01-03 | — | — | US | disclosed |
| US-4008084-A | SUPPORT, ALUMINUM INTERMEDIATE LAYER, PHOTOSENSITIVE RESIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-02-15 | — | — | US | disclosed |