Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.75 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | TP53 | P04637 | 4/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL55331 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL5953585 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL1005362 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL5954227 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL19410605 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| Etoglucid SCHEMBL8442 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL5954248 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL13583289 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL21932618 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL28208576 | 1.00 | TSHR (0.75) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116731302-A | Comb copolymer demulsifier and preparation method and application thereof | 麦加芯彩新材料科技(上海)股份有限公司 | 2023-09-12 | — | — | CN | claimed |
| CN-112882342-B | Laminate body | 旭化成株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-110941140-B | Photosensitive resin composition | 旭化成株式会社 | 2023-09-15 | — | — | CN | disclosed |
| CN-116731302-A | Comb copolymer demulsifier and preparation method and application thereof | 麦加芯彩新材料科技(上海)股份有限公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-112882342-A | Laminated body | 旭化成株式会社 | 2021-06-01 | — | — | CN | disclosed |
| CN-107077067-B | Photosensitive resin composition, photosensitive resin laminate, method for producing resin pattern, cured film, and display device | 旭化成株式会社 | 2021-04-13 | — | — | CN | disclosed |
| CN-106997148-B | Laminated body | 旭化成株式会社 | 2020-12-29 | — | — | CN | disclosed |
| CN-110941140-A | Photosensitive resin composition | 旭化成株式会社 | 2020-03-31 | — | — | CN | disclosed |
| CN-106918993-B | Photosensitive resin composition, photosensitive resin laminate, and method for forming protective pattern | 旭化成株式会社 | 2020-03-10 | — | — | CN | disclosed |
| US-10338468-B2 | Photosensitive resin composition, photosensitive resin laminate, resin pattern production method, cured film, and display device | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-07-02 | — | — | US | disclosed |
| EP-2832759-B1 | EPOXY RESIN, METHOD FOR PRODUCING EPOXY RESIN, EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND HEAT-DISSIPATING RESIN MATERIAL | DAINIPPON INK & CHEMICALS (JP) | 2017-03-15 | — | — | EP | disclosed |
| US-9441069-B2 | Epoxy resin, method for producing epoxy resin, epoxy resin composition, cured product thereof, and heat-dissipating resin material | DIC CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-20150104651-A1 | EPOXY RESIN, METHOD FOR PRODUCING EXPOXY RESIN, EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND HEAT-DISSIPATING RESIN MATERIAL | DIC CORPORATION (JP) | 2015-04-16 | — | — | US | disclosed |
| EP-2832759-A1 | EPOXY RESIN, METHOD FOR PRODUCING EPOXY RESIN, EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND HEAT-DISSIPATING RESIN MATERIAL | DIC Corporation (JP) | 2015-02-04 | — | — | EP | disclosed |
| EP-0608132-B1 | Coating varnish composition and antifouling coating composition | HITACHI CHEMICAL CO LTD (JP) | 1998-05-20 | — | — | EP | disclosed |
| US-5484457-A | Continuous production of surface dyeings on cellulose fiber textile materials | BASF AKTIENGESELLSCHAFT (DE) | 1996-01-16 | — | — | US | disclosed |
| US-5439511-A | Composition containing polymer obtained by polymerizing unsaturated acid anhydride and another unsaturated compound, specified additive | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-08-08 | — | — | US | disclosed |
| EP-0608132-A1 | Coating varnish composition and antifouling coating composition | HITACHI CHEMICAL CO., LTD. (JP) | 1994-07-27 | — | — | EP | disclosed |
| US-5224963-A | Improving perspiration fastness | BASF AKTIENGESELLSCHAFT (DE) | 1993-07-06 | — | — | US | disclosed |
| US-5015754-A | Cationic polyethers for fixing reative and direct dyes used for dyeing and printing cellulose textiles; washfastness | BASF AKTIENGESELLSCHAFT (DE) | 1991-05-14 | — | — | US | disclosed |