Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 3/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL28260736 | 0.82 | PTGS1 (0.31) | POLBTDP1PTGS1AKR1C3APEX1 | |
| Acetic Acid SCHEMBL539228 | 0.79 | POLB (0.40) | POLBTDP1KDM4ELMNAAPEX1 | |
| SCHEMBL27531633 | 0.76 | HTT (0.45) | HTTKMT2APOLBTDP1ALDH1A1 | |
| SCHEMBL623108 | 0.76 | HTT (0.45) | HTTKMT2APOLBTDP1ALDH1A1 | |
| SCHEMBL6040109 | 0.76 | HTT (0.45) | HTTKMT2APOLBTDP1ALDH1A1 | |
| SCHEMBL5894 | 0.76 | — | — | |
| SCHEMBL28517 | 0.76 | — | — | |
| SCHEMBL623803 | 0.76 | HTT (0.45) | HTTKMT2APOLBTDP1ALDH1A1 | |
| SCHEMBL5893 | 0.76 | — | — | |
| Methacrylic Acid SCHEMBL372591 | 0.75 | TDP1 (0.34) | POLBTDP1LMNAAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0552799-B1 | Photosensitive resin composition for flexographic printing plate | NIPPON PAINT CO LTD (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0513493-B1 | Photosensitive resin composition | NIPPON PAINT CO LTD (JP) | 1997-12-17 | — | — | EP | disclosed |
| US-5622813-A | WATER DEVELOPMENT; STORAGE STABILITY | NIPPON PAINT CO., LTD. (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0719425-A1 | PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING | CHASE ELASTOMER CORPORATION (US) | 1996-07-03 | — | — | EP | disclosed |
| US-5496685-A | MANUFACTURING A PRINTING PLATE | CHASE ELASTOMER CORPORATION (US) | 1996-03-05 | — | — | US | disclosed |
| US-5496684-A | IMAGE WISE EXPOSURE TO ACTINIC RADIATION FOR LIGHT SENSITIVE ELEMENT SUPPORTS, REMOVAL OF LAYER WITH SOLVENT FOR PLATES AND DEVELOPMENT OF CROSSLINKING AGENT | CHASE ELASTOMER CORPORATION (US) | 1996-03-05 | — | — | US | disclosed |
| WO-1995008137-A1 | PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING | CHASE ELASTOMER CORPORATION (US) | 1995-03-23 | — | — | WO | disclosed |
| WO-1995008136-A1 | PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING | CHASE ELASTOMER CORPORATION (US) | 1995-03-23 | — | — | WO | disclosed |
| US-5344744-A | For flexographic printing plate, water developable, elasticity wear resistance | NIPPON PAINT CO., LTD. (JP) | 1994-09-06 | — | — | US | disclosed |
| EP-0552799-A1 | Photosensitive resin composition for flexographic printing plate | Nippon Paint Co., Ltd. (JP) | 1993-07-28 | — | — | EP | disclosed |
| EP-0154512-A2 | Tapered di-block copolymer photopolymerizable composition | W.R. Grace & Co.-Conn. (US) | 1985-09-11 | — | — | EP | disclosed |
| US-4446220-A | MERCAPTOCARBOXYLIC ACID MODIFIED DIENE POLYMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-01 | — | — | US | disclosed |
| US-4431723-A | MERCAPTOCARBOXYLIC ACID MODIFIED BUTADIENE OR ISOPRENE POLYMER, UNSATURATED COMPOUND AND FREE RADICAL CATALYST ACTIVATED BY ACTINIC RADIATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-02-14 | — | — | US | disclosed |
| US-4423135-A | THERMOPLASTIC BLOCK COPOLYMER, ETHYLENICALLY UNSATURATED COMPOUND, AND PHOTOINITIATOR | E. I. DU PONT DE NEMOURS & CO. (US) | 1983-12-27 | — | — | US | disclosed |
| EP-0076028-A2 | Aqueous processible, alcohol resistant flexographic printing plates | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-04-06 | — | — | EP | disclosed |
| US-4369246-A | ETHYLENICALLY UNSATURATED COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-01-18 | — | — | US | disclosed |
| US-4323636-A | THERMOPLASTIC AND ELASTOMERIC IN CONJUNCTION WITH AN ACRYLATE COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-06 | — | — | US | disclosed |
| US-4323637-A | THERMOPLASTIC ELASTOMERIC LAYER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-06 | — | — | US | disclosed |
| US-4272608-A | CARBOXYLATED BUTADIENE-ACRYLONITRILE COPOLYMER, AN ETHYLENICALLY UNSATURATED COMPOUND, AND A FREE RADICAL GENERATING SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-06-09 | — | — | US | disclosed |
| US-4177074-A | HIGH AND LOW MOLECULAR WEIGHT POLYMERS CONTAINING CARBOXYL GROUPS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-12-04 | — | — | US | disclosed |