⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6580360 | 0.75 | — | — | |
| SCHEMBL9562355 | 0.69 | — | — | |
| SCHEMBL28104903 | 0.69 | — | — | |
| SCHEMBL6885956 | 0.69 | — | — | |
| SCHEMBL15915762 | 0.69 | — | — | |
| SCHEMBL8622013 | 0.69 | TSHR (0.32) | — | |
| SCHEMBL6228807 | 0.67 | — | — | |
| SCHEMBL7764016 | 0.64 | — | — | |
| SCHEMBL7711909 | 0.64 | — | — | |
| SCHEMBL17694546 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7268201-B2 | Insulating-film forming material and insulating film using the same | FUJIFILM CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| US-5744196-A | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1998-04-28 | — | — | US | disclosed |
| EP-0721019-A2 | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1996-07-10 | — | — | EP | disclosed |