SCHEMBL8631476

SCHEMBL8631476

Nc1cc(N)cc(C(=O)Oc2cccc(O)c2)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.60
ESR2 Q92731 2/20 0.60
CYP3A4 P08684 2/20 0.54
NSD2 O96028 1/20 0.47
KMT2A Q03164 3/20 0.46
MEN1 O00255 2/20 0.46
CASP3 P42574 1/20 0.46
SENP8 Q96LD8 1/20 0.46
SENP7 Q9BQF6 1/20 0.46
SENP6 Q9GZR1 1/20 0.46
SERPINE1 P05121 1/20 0.46
POLB P06746 1/20 0.45
NR1H4 Q96RI1 1/20 0.44
MAPT P10636 2/20 0.43
LMNA P02545 1/20 0.43
TP53 P04637 1/20 0.43
ADORA3 P0DMS8 1/20 0.43
CHRM1 P11229 1/20 0.43
TBXA2R P21731 1/20 0.43
SLC6A2 P23975 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13292724 0.86 NSD2 (0.46) ESR1ESR2CYP3A4NSD2KMT2A
SCHEMBL10784489 0.84 ESR1 (0.66) ESR1ESR2CYP3A4NSD2KMT2A
SCHEMBL11198376 0.84 ESR1 (0.66) ESR1ESR2CYP3A4NSD2KMT2A
SCHEMBL688991 0.84 ESR1 (0.70) ESR1ESR2CYP3A4NSD2KMT2A
SCHEMBL10782190 0.82 ESR1 (0.78) ESR1ESR2CYP3A4NSD2KMT2A
SCHEMBL689959 0.82 ESR1 (0.78) ESR1ESR2CYP3A4NSD2KMT2A
SCHEMBL2633411 0.82 NSD2 (0.62) CYP3A4NSD2KMT2AMEN1MAPT
SCHEMBL10033583 0.82 MAPT (0.62) ESR1ESR2CYP3A4KMT2AMEN1
SCHEMBL13064988 0.81 NSD2 (0.72) ESR1ESR2CYP3A4NSD2KMT2A
Benzoic Acid 3-Hydroxyphenyl Ester SCHEMBL78117 0.81 ESR1 (0.71) ESR1ESR2CYP3A4NSD2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130237040-A1 RESIN COMPOSITION, LAMINATE AND PROCESS FOR PRODUCTION THEREOF, STRUCTURE AND PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF ELECTRONIC DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2013-09-12 US disclosed
US-5747625-A Silicate group-containing polyimide NIPPON STEEL CHEMICAL CO., LTD. (JP) 1998-05-05 US disclosed