⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5892413 | 0.93 | — | — | |
| SCHEMBL31066753 | 0.84 | ALDH1A1 (0.32) | — | |
| SCHEMBL25862136 | 0.84 | ALDH1A1 (0.32) | — | |
| SCHEMBL2499563 | 0.82 | — | — | |
| SCHEMBL13241895 | 0.81 | — | — | |
| SCHEMBL16853726 | 0.80 | MEN1 (0.37) | — | |
| SCHEMBL24581181 | 0.78 | — | — | |
| SCHEMBL2499595 | 0.78 | CA12 (0.35) | — | |
| SCHEMBL75994 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL346186 | 0.77 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250147425-A1 | STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-05-08 | — | — | US | claimed |
| CN-119937261-A | Release agent composition and method of forming pattern using the same | 三星显示有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-107357142-B | Aqueous photoresist stripping liquid and preparation method thereof | 杭州格林达电子材料股份有限公司 | 2021-01-26 | — | — | CN | claimed |
| US-7049275-B2 | Photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-05-23 | — | — | US | claimed |
| JP-59108276-A | — | — | None | — | — | JP | disclosed |
| US-20260088294-A1 | POSITIVE ELECTRODES AND RECHARGEABLE LITHIUM BATTERIES INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2026-03-26 | — | — | US | disclosed |
| EP-4715884-A1 | POSITIVE ELECTRODES AND RECHARGEABLE LITHIUM BATTERIES INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2026-03-25 | — | — | EP | disclosed |
| US-20250147425-A1 | STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-05-08 | — | — | US | disclosed |
| CN-119937261-A | Release agent composition and method of forming pattern using the same | 三星显示有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-118496107-B | Organic small molecule inhibitor and application method thereof in thin film deposition | 合肥安德科铭半导体科技有限公司 | 2024-10-29 | — | — | CN | disclosed |
| CN-118496107-A | Organic small molecule inhibitor and application method thereof in thin film deposition | 合肥安德科铭半导体科技有限公司 | 2024-08-16 | — | — | CN | disclosed |
| WO-2023176209-A1 | TOSYLIC ACID ANIONIC IONIC LIQUID | 日清紡ホールディングス株式会社 | 2023-09-21 | — | — | WO | disclosed |
| EP-1808875-A1 | ELECTROLYTE FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR UTILIZING THE SAME | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-07-18 | — | — | EP | disclosed |
| US-7049275-B2 | Photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-05-23 | — | — | US | disclosed |
| US-20030181344-A1 | Photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2003-09-25 | — | — | US | disclosed |
| US-6441254-B1 | REACTING FORMALDEHYDE AND ALDEHYDE IN PRESENCE OF A NITROGEN BASE TO FORM MIXTURE CONTAINING TRIMETHYLOL COMPOUND AND FORMATE SALT OF NITROGEN BASE; REMOVING TRIMETHYLOL COMPOUND; DISTILLATION OF FORMATE SALTS INTO BASE AND FORMIC ACID | BAYER AKTIENGESELLSCHAFT (DE) | 2002-08-27 | — | — | US | disclosed |
| EP-1216979-A1 | Process for the preparation of trimethylol alcanes and formic acid | BAYER AG (DE) | 2002-06-26 | — | — | EP | disclosed |
| US-20020077502-A1 | PROCESS FOR PREPARING TRIMETHYLOL COMPOUNDS AND FORMIC ACID | BAYER AKTIENGESELLSCHAFT (DE) | 2002-06-20 | — | — | US | disclosed |
| JP-S59108276-A | ORGANIC ELECTROLYTIC BATTERY | HITACHI MAXELL LTD | 1984-06-22 | — | — | JP | disclosed |
| US-4055450-A | GALACTOMANNAN GUM, ALKALI METAL, ALKALINE EARTH OR AMMONIUM NITRATE, CHLORATE OR PERCHLORATE | ICI AUSTRALIA LIMITED (AU) | 1977-10-25 | — | — | US | disclosed |