SCHEMBL8634087

SCHEMBL8634087

CC(OCCOCCO)OCCOCCO

nearest known ligand 0.58

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.58
KMT2A Q03164 5/20 0.58
TSHR P16473 2/20 0.53
MAPK1 P28482 2/20 0.53
THRB P10828 1/20 0.44
HTT P42858 1/20 0.44
MAPT P10636 1/20 0.44
ALDH1A1 P00352 2/20 0.43
LMNA P02545 2/20 0.35
APP P05067 4/20 0.30
USP2 O75604 1/20 0.30
CYP3A4 P08684 1/20 0.30
CASP1 P29466 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
SLCO1B3 Q9NPD5 1/20 0.30
SLCO1B1 Q9Y6L6 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5275388 0.91 LMNA (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL28788474 0.90 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL9633934 0.88 MEN1 (0.50) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL4308047 0.88 MEN1 (0.50) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL2721221 0.87 TSHR (0.61) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL17789960 0.86 MEN1 (0.48) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL17789986 0.86 MEN1 (0.48) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL16353691 0.85 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL9639782 0.84 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL9640229 0.84 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9798242-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-24 US disclosed
US-9632416-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-25 US disclosed
US-9524863-B2 Method for cleaning and drying semiconductor substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-20 US disclosed
US-9372404-B2 Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-21 US disclosed
US-20160154312-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed
US-20160154314-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed
US-20150221500-A1 METHOD FOR CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-06 US disclosed
US-20130302990-A1 ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTERNING PROCESS USING THIS, AND HEAT-DECOMPOSABLE POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-14 US disclosed
US-5853713-A Biologically compatible linear block copolymers of polyalkylene oxide and peptide units STERLING WINTHROP INC. (US) 1998-12-29 US disclosed
US-5618528-A Biologically compatible linear block copolymers of polyalkylene oxide and peptide units STERLING WINTHROP INC. (US) 1997-04-08 US disclosed
EP-0748226-A1 BLOCK COPOLYMERS NYCOMED IMAGING AS (NO) 1996-12-18 EP disclosed
WO-1995022991-A2 BLOCK COPOLYMERS NYCOMED IMAGING AS (NO) 1995-08-31 WO disclosed