SCHEMBL864183

SCHEMBL864183

C=CC(=O)OC(C)[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3182166 0.82
SCHEMBL26841662 0.81 TSHR (0.50)
SCHEMBL2727797 0.81 TSHR (0.50)
SCHEMBL25921 0.81
SCHEMBL31332333 0.81 HCAR2 (0.52)
Ethylene SCHEMBL5972217 0.79 HCAR2 (0.50)
Ammonia Solution, Strong SCHEMBL1881209 0.79
SCHEMBL1618752 0.79
SCHEMBL21630259 0.79 TSHR (0.48)
SCHEMBL20730 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107109166-A Adhesion promoting acrylate contact adhesive with low acid content 3M创新有限公司 2017-08-29 CN claimed
EP-0719425-A1 PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING CHASE ELASTOMER CORPORATION (US) 1996-07-03 EP claimed
WO-1995008137-A1 PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING CHASE ELASTOMER CORPORATION (US) 1995-03-23 WO claimed
EP-0162550-B1 HALOGEN-CONTAINING LENS MATERIAL KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1989-12-13 EP claimed
WO-2024143339-A1 OPTICAL ANISOTROPIC LAYER, LIGHT GUIDE ELEMENT, AND AR DISPLAY DEVICE 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143347-A1 OPTICAL ANISOTROPIC LAYER, LAMINATE, LIGHT GUIDE ELEMENT, AND AR DISPLAY DEVICE 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143320-A1 CURED PRODUCT OF PHOTOCURABLE COMPOSITION, OPTICAL COMPONENT, LIGHT-EMITTING DEVICE, AND MODULE 京セラ株式会社 2024-07-04 WO disclosed
CN-118027412-A Photo-alignment material 罗利克技术有限公司 2024-05-14 CN disclosed
US-11977290-B2 Liquid crystal diffraction element, optical element, image display unit, head-mounted display, beam steering, and sensor FUJIFILM CORPORATION (JP) 2024-05-07 US disclosed
CN-114729216-B Radiation curable inkjet ink, decorative sheet and method for producing a decorative sheet 3M创新有限公司 2024-04-05 CN disclosed
US-20240045334-A1 EXPOSURE METHOD OF PHOTOALIGNMENT LAYER FUJIFILM CORPORATION (JP) 2024-02-08 US disclosed
US-20240045335-A1 EXPOSURE METHOD OF PHOTOALIGNMENT LAYER FUJIFILM CORPORATION (JP) 2024-02-08 US disclosed
US-4847336-A Process for the preparation of acryloyloxyethoxymethyl-melamines ULANO CORPORATION (US) 1989-07-11 US disclosed
US-4701300-A Polyamide ester photoresist formulations of enhanced sensitivity MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1987-10-20 US disclosed
US-4672956-A BLEND OR HYDROPHILIC POLYMER AND POLYETHER-STORAGE STABILITY SMITH AND NEPHEW ASSOCIATED COMPANIES P.L.C (GB) 1987-06-16 US disclosed
US-4655202-A SUPPORT WITH VINYL COMPOUND AND WATER ACTIVATED, ENCAPSULATED POLYMERIZATION CATALYST SMITH AND NEPHEW ASSOCIATED COMPANIES P.L.C. (GB) 1987-04-07 US disclosed
EP-0206074-A2 Methacrylic-acid esters and their use BAYER AG (DE) 1986-12-30 EP disclosed
EP-0094222-B1 BANDAGES, COMPONENTS THEREOF AND USE Smith and Nephew Associated Companies p.l.c. (GB) 1986-08-20 EP disclosed
WO-1983003973-A1 BANDAGES, COMPONENTS THEREOF AND USE SMITH AND NEPHEW ASSOCIATED COMPANIES P.L.C. (GB) 1983-11-24 WO disclosed
EP-0094222-A1 Bandages, components thereof and use Smith and Nephew Associated Companies p.l.c. (GB) 1983-11-16 EP disclosed