SCHEMBL864266

SCHEMBL864266

OCCOCCC(O)CO

nearest known ligand 0.53

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.53
MAPK1 P28482 1/20 0.53
THRB P10828 2/20 0.52
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
ALDH1A1 P00352 2/20 0.40
LMNA P02545 2/20 0.40
HTT P42858 1/20 0.34
MAPT P10636 1/20 0.34
USP2 O75604 1/20 0.34
PLA2G2C Q5R387 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9643980 0.97 MEN1 (0.55) TSHRMAPK1THRBMEN1KMT2A
SCHEMBL28804657 0.97 MEN1 (0.55) TSHRMAPK1THRBMEN1KMT2A
SCHEMBL18440476 0.92 THRB (0.53) TSHRMAPK1THRBMEN1KMT2A
Triethylene Glycol SCHEMBL21571488 0.87 THRB (0.65) TSHRMAPK1THRBMEN1KMT2A
Di(Hydroxyethyl)Ether SCHEMBL1616901 0.86 TSHR (0.62) TSHRMAPK1THRBMEN1KMT2A
Di(Hydroxyethyl)Ether SCHEMBL27602303 0.86 TSHR (0.62) TSHRMAPK1THRBMEN1KMT2A
SCHEMBL863361 0.85 THRB (0.48) TSHRMAPK1THRBMEN1KMT2A
SCHEMBL25904069 0.85 THRB (0.48) TSHRMAPK1THRBMEN1KMT2A
Tetraethylene Glycol SCHEMBL617711 0.83 MEN1 (0.65) TSHRMAPK1THRBMEN1KMT2A
Triethylene Glycol SCHEMBL618788 0.83 MEN1 (0.65) TSHRMAPK1THRBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110759813-A Method for purifying coal-to-ethylene glycol based on static melt crystallization device 太原理工大学 2020-02-07 CN claimed
US-9120932-B2 Ink set and ink jet recording method using the ink set SEIKO EPSON CORPORATION (JP) 2015-09-01 US claimed
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US claimed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US claimed
CN-114656332-B Composition, preparation method and application thereof 中国石油化工股份有限公司 2024-06-14 CN disclosed
CN-117836044-A Defoaming agent, lubricating oil composition containing defoaming agent, and machine using lubricating oil composition DIC株式会社 2024-04-05 CN disclosed
CN-116640293-A Epoxy ester resin, vinyl-modified epoxy ester resin, resin composition, paint, and article coated with the paint DIC株式会社 2023-08-25 CN disclosed
US-20230242829-A1 FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM SHOWA DENKO K.K. (JP) 2023-08-03 US disclosed
CN-116507655-A Polymer containing silicone chain and coating composition containing the same DIC株式会社 2023-07-28 CN disclosed
WO-2023090829-A1 LOW-MOLECULAR-WEIGHT COMPOUND FOR REGULATING MLL1-WDR5 INTERACTION AND USE THEREOF 엘젠테라퓨틱스 주식회사 2023-05-25 WO disclosed
CN-116034143-A Polymer, coating composition, resist composition and article DIC株式会社 2023-04-28 CN disclosed
CN-114846040-A Polymer and coating composition containing the same DIC株式会社 2022-08-02 CN disclosed
CN-106795079-A The method that ethylene glycol is prepared from sugar 托普索公司 2017-05-31 CN disclosed
US-9120932-B2 Ink set and ink jet recording method using the ink set SEIKO EPSON CORPORATION (JP) 2015-09-01 US disclosed
US-8163095-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-04-24 US disclosed
US-20120075380-A1 INK SET AND INK JET RECORDING METHOD USING THE INK SET SEIKO EPSON CORPORATION 2012-03-29 US disclosed
US-20110206829-A1 COMPOSITION FOR STRIPPING AND STRIPPING METHOD SAMSUNG DISPLAY CO., LTD. (KR) 2011-08-25 US disclosed
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US disclosed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US disclosed
CN-101398639-A Composition for stripping and stripping method SAMSUNG ELECTRONICS CO LTD (KR) 2009-04-01 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230242829-A1 FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM AFF2, NEFM, AFF4 TSHR 400/4885MAPK1 297/4885THRB 914/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.