Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.51 |
| ▸ | TSHR | P16473 | 10/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.45 |
| ▸ | TP53 | P04637 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.42 |
| ▸ | NPC1 | O15118 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.40 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL29861241 | 1.00 | ALDH1A1 (0.53) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| Acrylic Acid SCHEMBL25334808 | 0.95 | CYP3A4 (0.56) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| Acrylic Acid SCHEMBL31190372 | 0.91 | TSHR (0.51) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| Propene SCHEMBL840673 | 0.91 | ALDH1A1 (0.53) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| Ethylene SCHEMBL5534814 | 0.90 | ALDH1A1 (0.59) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| SCHEMBL29668022 | 0.90 | ALDH1A1 (0.62) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| SCHEMBL159456 | 0.90 | ALDH1A1 (0.62) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| Water SCHEMBL11188129 | 0.89 | ALDH1A1 (0.61) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| Ammonia Solution, Strong SCHEMBL29142354 | 0.89 | ALDH1A1 (0.61) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 | |
| SCHEMBL28087956 | 0.89 | ALDH1A1 (0.61) | ALDH1A1CYP3A4TSHRTDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3998160-B1 | PRINTING SHEET AND METHOD FOR MANUFACTURING PRINTING SHEET | TBM CO LTD (JP) | 2026-03-11 | — | — | EP | disclosed |
| US-20250273501-A1 | TEMPORARY PROTECTION FILM FOR PRODUCTION OF SEMICONDUCTOR DEVICE AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE | RESONAC CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-12240986-B2 | Thermally curable ink-jet ink | Konica Minolta, Inc. (JP) | 2025-03-04 | — | — | US | disclosed |
| WO-2025041607-A1 | TEMPORARY PROTECTION FILM FOR SEMICONDUCTOR DEVICE MANUFACTURING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 株式会社レゾナック | 2025-02-27 | — | — | WO | disclosed |
| WO-2025041609-A1 | TEMPORARY PROTECTION FILM FOR SEMICONDUCTOR DEVICE PRODUCTION AND SEMICONDUCTOR DEVICE PRODUCTION METHOD | 株式会社レゾナック | 2025-02-27 | — | — | WO | disclosed |
| CN-119343763-A | Temporary protective film for semiconductor device manufacture and method for manufacturing semiconductor device | 株式会社力森诺科 | 2025-01-21 | — | — | CN | disclosed |
| WO-2024247842-A1 | ELECTRON-BEAM-CURABLE AQUEOUS COMPOSITION AND METHOD FOR PRODUCING (METH)ACRYLATE-BASED POLYMER | 東亞合成株式会社 | 2024-12-05 | — | — | WO | disclosed |
| WO-2024225272-A1 | LAMINATE AND METHOD FOR PRODUCING RECYCLED FILM | ＡＧＣ株式会社 | 2024-10-31 | — | — | WO | disclosed |
| US-20240351360-A1 | PRINTING SHEET AND METHOD FOR PRODUCING PRINTING SHEET | TBM CO., LTD. (JP) | 2024-10-24 | — | — | US | disclosed |
| US-20240343933-A1 | PRINTING SHEET AND METHOD FOR PRODUCING PRINTING SHEET | TBM CO., LTD. (JP) | 2024-10-17 | — | — | US | disclosed |
| US-20080146712-A1 | Ink-jet recording ink | SEIKO EPSON CORPORATION (JP) | 2008-06-19 | — | — | US | disclosed |
| US-20070259287-A1 | Resin Composition for Forming Fine Pattern and Method for Forming Fine Pattern | JSR CORPORATION (JP) | 2007-11-08 | — | — | US | disclosed |
| EP-1757990-A1 | RESIN COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1406981-A1 | FLOOR POLISH COMPOSITION | JohnsonDiversey, Inc. (US) | 2004-04-14 | — | — | EP | disclosed |
| WO-2003002678-A1 | FLOOR POLISH COMPOSITION | JOHNSONDIVERSEY, INC. (US) | 2003-01-09 | — | — | WO | disclosed |
| EP-0832757-B1 | REVERSIBLE THERMAL RECORDING MEDIUM | OJI PAPER CO (JP) | 2001-08-22 | — | — | EP | disclosed |
| US-6231984-B1 | CATIONIC ELECTRODEPOSITED FILM | KANSAI PAINT CO., LTD. (JP) | 2001-05-15 | — | — | US | disclosed |
| US-5928988-A | CONTAINING SULFONYLUREA COLOR DEVELOPER | OJI PAPER CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0914875-A2 | Multilayer coating film formation process | KANSAI PAINT CO., LTD. (JP) | 1999-05-12 | — | — | EP | disclosed |
| EP-0832757-A1 | REVERSIBLE THERMAL RECORDING MEDIUM | Oji Paper Co., Ltd. (JP) | 1998-04-01 | — | — | EP | disclosed |