Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.44 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.44 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.44 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.44 |
| ▸ | GALR3 | O60755 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.32 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propene SCHEMBL28869207 | 1.00 | TSHR (0.44) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Ethylene SCHEMBL27869594 | 0.90 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL23294918 | 0.89 | TSHR (0.52) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL15667 | 0.89 | — | — | |
| SCHEMBL3249555 | 0.89 | — | — | |
| SCHEMBL3255632 | 0.89 | — | — | |
| SCHEMBL3797009 | 0.87 | TSHR (0.50) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Ammonia Solution, Strong SCHEMBL22607978 | 0.87 | TSHR (0.50) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Methyl Alcohol SCHEMBL157460 | 0.87 | TSHR (0.50) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Methoxymethane SCHEMBL28261416 | 0.87 | TSHR (0.50) | TSHRCHRM2CHRM4CHRM1TBXA2R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | claimed |
| US-20190346763-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-14 | — | — | US | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| US-10180627-B2 | Processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-01-15 | — | — | US | disclosed |
| EP-2189845-B1 | Compositions and processes for photolithography | ROHM & HAAS ELECT MAT (US) | 2017-08-02 | — | — | EP | disclosed |
| US-9507260-B2 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-11-29 | — | — | US | disclosed |
| EP-3051348-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | Rohm and Haas Electronic Materials LLC (US) | 2016-08-03 | — | — | EP | disclosed |
| CN-101943857-B | For composition and the method for photoetching | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2016-05-11 | — | — | CN | disclosed |
| CN-101943860-B | Processes for photolithography | ROHM & HAAS ELECT MAT | 2013-12-11 | — | — | CN | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| EP-2280308-A1 | Processes for photolithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2011-02-02 | — | — | EP | disclosed |
| CN-101943860-A | Lithographic process | ROHM & HAAS ELECT MAT | 2011-01-12 | — | — | CN | disclosed |
| CN-101943857-A | Compositions and processes for photolithography | ROHM & HAAS ELECT MAT | 2011-01-12 | — | — | CN | disclosed |
| US-20110003257-A1 | PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-01-06 | — | — | US | disclosed |
| US-20100304290-A1 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-02 | — | — | US | disclosed |
| US-20100297549-A1 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-25 | — | — | US | disclosed |
| EP-2189845-A2 | Compositions and processes for photolithography | Rohm and Haas Electronic Materials LLC (US) | 2010-05-26 | — | — | EP | disclosed |
| EP-2189847-A2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | Rohm and Haas Electronic Materials LLC (US) | 2010-05-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | FRG1, AFF2, FBXL19 | TSHR 2270/4885CHRM2 2864/4885CHRM4 3659/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.