⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5646737 | 0.82 | — | — | |
| SCHEMBL3617327 | 0.80 | — | — | |
| SCHEMBL6248379 | 0.78 | — | — | |
| SCHEMBL6249133 | 0.78 | — | — | |
| SCHEMBL6251095 | 0.78 | — | — | |
| SCHEMBL10430972 | 0.78 | — | — | |
| SCHEMBL251009 | 0.77 | — | — | |
| SCHEMBL866272 | 0.77 | — | — | |
| SCHEMBL9166993 | 0.73 | — | — | |
| SCHEMBL27956206 | 0.73 | CES2 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107209146-B | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2024-03-12 | — | — | CN | disclosed |
| WO-2023174773-A1 | PHOTOALIGNING MATERIALS | Rolic Technologies AG (CH) | 2023-09-21 | — | — | WO | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-104649916-B | Photocrosslinkable materials | 罗利克有限公司 | 2020-12-01 | — | — | CN | disclosed |
| EP-3647835-A1 | COLORING STRUCTURE, DISPLAY BODY, AND METHOD FOR MANUFACTURING COLORING STRUCTURE | Toppan Printing Co., Ltd. (JP) | 2020-05-06 | — | — | EP | disclosed |
| US-20200132900-A1 | COLOR DEVELOPING STRUCTURE, DISPLAY, AND METHOD FOR PRODUCING COLOR DEVELOPING STRUCTURE | TOPPAN PRINTING CO., LTD. (JP) | 2020-04-30 | — | — | US | disclosed |
| CN-110799861-A | Color developing structure, display body, and method for producing color developing structure | 凸版印刷株式会社 | 2020-02-14 | — | — | CN | disclosed |
| US-10208031-B2 | Photocrosslinkable materials comprising alicyclic group | ROLIC AG (CH) | 2019-02-19 | — | — | US | disclosed |
| EP-2829542-B1 | BENZOBIS(THIADIAZOLE) DERIVATIVE AND ORGANIC ELECTRONICS DEVICE USING SAME | UBE INDUSTRIES (JP) | 2018-07-11 | — | — | EP | disclosed |
| US-20170362381-A1 | THERMALLY STABLE ALIGNMENT MATERIALS | ROLIC AG (CH) | 2017-12-21 | — | — | US | disclosed |
| WO-2007071091-A1 | PHOTOCROSSLINKABLE MATERIALS | ROLIC AG (CH) | 2007-06-28 | — | — | WO | disclosed |
| EP-1801097-A1 | Photocrosslinkable materials | Rolic AG (CH) | 2007-06-27 | — | — | EP | disclosed |
| EP-1740663-A1 | LOW REFRACTIVE INDEX COATING COMPOSITION | JSR Corporation (JP) | 2007-01-10 | — | — | EP | disclosed |
| EP-1740664-A1 | LOW REFRACTIVE INDEX COATING COMPOSITION | JSR Corporation (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-20060084756-A1 | Low refractive index coating composition | DSM IP ASSETS B.V. (NL) | 2006-04-20 | — | — | US | disclosed |
| US-6994946-B2 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-02-07 | — | — | US | disclosed |
| US-20050261389-A1 | Low refractive index coating composition | DSM IP ASSETS B.V. (NL) | 2005-11-24 | — | — | US | disclosed |
| WO-2005103175-A1 | LOW REFRACTIVE INDEX COATING COMPOSITION | JSR CORPORATION (JP) | 2005-11-03 | — | — | WO | disclosed |
| WO-2005103177-A1 | LOW REFRACTIVE INDEX COATING COMPOSITION | JSR CORPORATION (JP) | 2005-11-03 | — | — | WO | disclosed |
| US-20040242821-A1 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |