SCHEMBL8663158

SCHEMBL8663158

C1=Cc2c(c3c(c4ccccc24)CCC=C3)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3419708 0.94 — —
SCHEMBL31488668 0.94 — —
SCHEMBL9459220 0.88 — —
SCHEMBL8662792 0.82 PARP1 (0.36) —
SCHEMBL5829699 0.80 ALDH1A1 (0.33) —
SCHEMBL22654590 0.80 ALDH1A1 (0.36) —
SCHEMBL28355964 0.79 — —
SCHEMBL30455704 0.79 — —
SCHEMBL23009848 0.77 CCNB2 (0.34) —
SCHEMBL25517258 0.77 PARP1 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5808154-A Process for the production of an aromatic hydrazo compound TOYO INK MANUFACTURING CO., LTD. (JP) 1998-09-15 — — US disclosed
EP-0391606-B1 Process for the production of an aromatic hydrazo compound TOYO INK MFG CO (JP) 1995-07-05 — — EP disclosed
EP-0391606-A1 Process for the production of an aromatic hydrazo compound TOYO INK MANUFACTURING CO., LTD. (JP) 1990-10-10 — — EP disclosed
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