SCHEMBL8664087

SCHEMBL8664087

Cc1ccc(S(=O)(=O)c2cccc([N+](=O)[O-])c2)cc1

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.80
GAA P10253 2/20 0.80
HTT P42858 1/20 0.80
CA2 P00918 2/20 0.60
CA5A P35218 1/20 0.60
NFE2L2 Q16236 1/20 0.58
TSHR P16473 1/20 0.58
ACHE P22303 1/20 0.58
CYP1A2 P05177 1/20 0.56
CYP3A4 P08684 1/20 0.56
CYP2C19 P33261 1/20 0.56
ALDH1A1 P00352 4/20 0.56
LMNA P02545 4/20 0.56
MAPT P10636 4/20 0.56
SMN1; SMN2 Q16637 2/20 0.56
KDM4E B2RXH2 1/20 0.56
CA1 P00915 1/20 0.55
MMP1 P03956 1/20 0.55
MMP2 P08253 1/20 0.55
MMP9 P14780 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9580710 0.89 KMT2A (1.00) KMT2AGAAHTTCA2CA5A
SCHEMBL10341547 0.88 KMT2A (0.89) KMT2AGAAHTTCA2CA5A
SCHEMBL3477247 0.88 KMT2A (0.89) KMT2AGAAHTTCA2CA5A
SCHEMBL28773331 0.83 KMT2A (0.80) KMT2AGAAHTTCA2CA5A
SCHEMBL11756876 0.83 KMT2A (0.80) KMT2AGAAHTTCA2CA5A
SCHEMBL27770522 0.83 KMT2A (0.80) KMT2AGAAHTTCA2CA5A
SCHEMBL8866076 0.83 KMT2A (0.64) KMT2AGAAHTTCA2CA5A
SCHEMBL28131806 0.83 KMT2A (0.73) KMT2AGAAHTTCA2CA5A
SCHEMBL16396322 0.83 KMT2A (0.73) KMT2AGAAHTTCA2CA5A
SCHEMBL6577803 0.82 ACHE (0.75) KMT2AGAACA2CA5AACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0465064-B1 Process for forming patterns FUJITSU LTD (JP) 1998-12-09 EP claimed
EP-0465064-A2 Resist and process for forming patterns using the same FUJITSU LIMITED (JP) 1992-01-08 EP claimed
EP-0465064-B1 Process for forming patterns FUJITSU LTD (JP) 1998-12-09 EP disclosed
EP-0465064-A2 Resist and process for forming patterns using the same FUJITSU LIMITED (JP) 1992-01-08 EP disclosed