Orthocresol

Orthocresol

SCHEMBL8664909

Cc1cccc(O)c1C.Cc1ccccc1O.Cc1ccccc1O

nearest known ligand 0.85

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.85
ATM Q13315 1/20 0.85
CYP1A2 P05177 2/20 0.50
CYP2C19 P33261 1/20 0.50
ALDH1A1 P00352 7/20 0.48
HSD17B10 Q99714 5/20 0.47
MAPT P10636 4/20 0.47
TP53 P04637 2/20 0.47
MAPK1 P28482 2/20 0.47
GAA P10253 1/20 0.47
LMNA P02545 4/20 0.46
TSHR P16473 3/20 0.46
HTT P42858 3/20 0.46
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
TDP1 Q9NUW8 3/20 0.43
RECQL P46063 3/20 0.43
HPGD P15428 3/20 0.43
KDM4E B2RXH2 3/20 0.43
EGFR P00533 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Orthocresol SCHEMBL3064108 1.00 TRPA1 (0.85) TRPA1ATMCYP1A2CYP2C19ALDH1A1
Orthocresol SCHEMBL9404100 1.00 TRPA1 (0.85) TRPA1ATMCYP1A2CYP2C19ALDH1A1
Orthocresol SCHEMBL1137719 0.93 TRPA1 (0.74) TRPA1ATMCYP1A2CYP2C19ALDH1A1
Orthocresol SCHEMBL2778122 0.93 TRPA1 (0.74) TRPA1ATMCYP1A2CYP2C19ALDH1A1
SCHEMBL3498 0.92
SCHEMBL5940935 0.92 TRPA1 (1.00) TRPA1ATMCYP1A2CYP2C19ALDH1A1
SCHEMBL29622820 0.92
Orthocresol SCHEMBL11213183 0.91 TRPA1 (0.71) TRPA1ATMCYP1A2CYP2C19ALDH1A1
Orthocresol SCHEMBL11030781 0.91 TRPA1 (0.71) TRPA1ATMCYP1A2CYP2C19ALDH1A1
Orthocresol SCHEMBL9297331 0.91 TRPA1 (0.71) TRPA1ATMCYP1A2CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5773200-A FORMING NOVOLAK RESIN PHOTORESIST CONTAINING 1,2-NAPHTHOQUINONEDIAZIDOSULFONYL GROUP ON SUBSTRATE, EXPOSING TO LIGHT, PATTERNING, DEVELOPING, BAKING, METALLIZING, STRIPPING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-06-30 US disclosed