⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL865500 | 0.80 | — | — | |
| SCHEMBL7181757 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL13935077 | 0.76 | — | — | |
| SCHEMBL865941 | 0.73 | FDPS (0.31) | — | |
| SCHEMBL14152068 | 0.73 | — | — | |
| SCHEMBL81194 | 0.72 | — | — | |
| SCHEMBL7229010 | 0.71 | — | — | |
| SCHEMBL17729796 | 0.69 | — | — | |
| SCHEMBL9947107 | 0.69 | TSHR (0.33) | — | |
| SCHEMBL6536228 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240209020-A1 | REACTION AGENT FOR AMIDE REACTION AND METHOD FOR PRODUCING AMIDE COMPOUND USING SAME | CHUBU UNIVERSITY EDUCATIONAL FOUNDATION (JP) | 2024-06-27 | — | — | US | disclosed |
| WO-2023174773-A1 | PHOTOALIGNING MATERIALS | Rolic Technologies AG (CH) | 2023-09-21 | — | — | WO | disclosed |
| US-20230002422-A1 | REACTION AGENT FOR AMIDE REACTIONS AND AMIDE COMPOUND PRODUCTION METHOD USING SAME | CHUBU UNIVERSITY EDUCATIONAL FOUNDATION (JP) | 2023-01-05 | — | — | US | disclosed |
| WO-2021085635-A1 | REACTION AGENT FOR AMIDE REACTION AND METHOD FOR PRODUCING AMIDE COMPOUND USING SAME | 学校法人中部大学 | 2021-05-06 | — | — | WO | disclosed |
| WO-2021085636-A1 | REACTION AGENT FOR AMIDE REACTIONS AND AMIDE COMPOUND PRODUCTION METHOD USING SAME | 学校法人中部大学 | 2021-05-06 | — | — | WO | disclosed |
| US-10208031-B2 | Photocrosslinkable materials comprising alicyclic group | ROLIC AG (CH) | 2019-02-19 | — | — | US | disclosed |
| US-20170362381-A1 | THERMALLY STABLE ALIGNMENT MATERIALS | ROLIC AG (CH) | 2017-12-21 | — | — | US | disclosed |
| EP-1966119-B1 | PHOTOCROSSLINKABLE MATERIALS | ROLIC AG (CH) | 2016-10-19 | — | — | EP | disclosed |
| EP-2152660-B1 | PHOTOCROSSLINKABLE MATERIALS COMPRISING ALICYCLIC GROUP | ROLIC AG (CH) | 2016-05-11 | — | — | EP | disclosed |
| US-8557922-B2 | Photocrosslinkable materials | ROLIC AG (CH) | 2013-10-15 | — | — | US | disclosed |
| EP-2142957-A1 | METHOD OF UNIFORM AND DEFECT FREE LIQUID CRYSTAL ALIGNING LAYERS | Rolic AG (CH) | 2010-01-13 | — | — | EP | disclosed |
| WO-2008145225-A2 | PHOTOCROSSLINKABLE MATERIALS COMPRISING ALICYCLIC GROUP | ROLIC AG (CH) | 2008-12-04 | — | — | WO | disclosed |
| US-20080293888-A1 | Photocrosslinkable Materials | ROLIC AG (CH) | 2008-11-27 | — | — | US | disclosed |
| WO-2008135131-A1 | THERMALLY STABLE ALIGNMENT MATERIALS | ROLIC AG (CH) | 2008-11-13 | — | — | WO | disclosed |
| WO-2008119449-A1 | METHOD OF UNIFORM AND DEFECT FREE LIQUID CRYSTAL ALIGNING LAYERS | ROLIC AG (CH) | 2008-10-09 | — | — | WO | disclosed |
| EP-1975687-A1 | Method of uniform and defect free liquid crystal aligning layers | Rolic AG (CH) | 2008-10-01 | — | — | EP | disclosed |
| EP-1966119-A1 | PHOTOCROSSLINKABLE MATERIALS | Rolic AG (CH) | 2008-09-10 | — | — | EP | disclosed |
| EP-1860094-A1 | Photocrosslinkable materials | Rolic AG (CH) | 2007-11-28 | — | — | EP | disclosed |
| WO-2007071091-A1 | PHOTOCROSSLINKABLE MATERIALS | ROLIC AG (CH) | 2007-06-28 | — | — | WO | disclosed |
| EP-1801097-A1 | Photocrosslinkable materials | Rolic AG (CH) | 2007-06-27 | — | — | EP | disclosed |