Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.34 |
| ▸ | CA2 | P00918 | 3/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL868041 | 0.94 | TSHR (0.34) | TSHRALDH1A1TDP1 | |
| SCHEMBL868633 | 0.94 | TSHR (0.34) | TSHRALDH1A1TDP1 | |
| SCHEMBL1618605 | 0.73 | CYP1A2 (0.36) | TSHRALDH1A1L3MBTL1KDM4EHPGD | |
| SCHEMBL11614258 | 0.66 | ALDH1A1 (0.38) | TSHRALDH1A1TDP1CYP3A4CA2 | |
| SCHEMBL2217145 | 0.62 | ALDH1A1 (0.50) | TSHRALDH1A1TDP1CYP3A4CA2 | |
| SCHEMBL387001 | 0.61 | — | — | |
| SCHEMBL3884493 | 0.61 | ALDH1A1 (0.68) | TSHRALDH1A1TDP1CYP3A4CA2 | |
| SCHEMBL31302662 | 0.61 | ALDH1A1 (0.48) | TSHRALDH1A1TDP1CYP3A4CA2 | |
| SCHEMBL26934761 | 0.61 | CHRM2 (0.42) | TSHRALDH1A1TDP1CYP3A4CA2 | |
| SCHEMBL14539190 | 0.60 | ALDH1A1 (0.48) | TSHRALDH1A1TDP1CYP3A4CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190071529-A1 | POLYMERS HAVING N-VINYL AMIDE AND HYDROXYL MOIETIES, THEIR COMPOSITIONS AND THE USES THEREOF | ISP INVESTMENTS LLC (US) | 2019-03-07 | — | — | US | claimed |
| US-20120077717-A1 | Polymers Having N-Vinyl Amide And Hydroxyl Moieties, Their Compositions And The Uses Thereof | ISP INVESTMENTS INC. (US) | 2012-03-29 | — | — | US | claimed |
| US-11780940-B2 | Hydrate inhibitors | BAKER HUGHES OILFIELD OPERATIONS LLC (US) | 2023-10-10 | — | — | US | disclosed |
| WO-2022005775-A1 | HYDRATE INHIBITORS | BAKER HUGHES OILFIELD OPERATIONS LLC (US) | 2022-01-06 | — | — | WO | disclosed |
| US-20210403618-A1 | HYDRATE INHIBITORS | BAKER HUGHES OILFIELD OPERATIONS LLC (US) | 2021-12-30 | — | — | US | disclosed |
| US-11072675-B2 | Polymers having N-vinyl amide and hydroxyl moieties, their compositions and the uses thereof | ISP INVESTMENTS LLC (US) | 2021-07-27 | — | — | US | disclosed |
| US-10400052-B2 | Polymers having N-vinyl amide and hydroxyl moieties, their compositions and the uses thereof | ISP INVESTMENTS LLC (US) | 2019-09-03 | — | — | US | disclosed |
| US-20190071529-A1 | POLYMERS HAVING N-VINYL AMIDE AND HYDROXYL MOIETIES, THEIR COMPOSITIONS AND THE USES THEREOF | ISP INVESTMENTS LLC (US) | 2019-03-07 | — | — | US | disclosed |
| EP-2985299-A1 | POLYMERS HAVING N-VINYL AMIDE AND HYDROXYL MOIETIES | ISP Investments Inc. (US) | 2016-02-17 | — | — | EP | disclosed |
| US-20150232729-A1 | ANTIFOGGING COMPOSITIONS AND METHODS OF MAKING THE SAME | Georgia Southern Research and Service Foundation | 2015-08-20 | — | — | US | disclosed |
| CN-101657511-B | Composition for coating over a photoresist pattern comprising a lactam | AZ ELECTRONIC MATERIALS USA | 2015-02-04 | — | — | CN | disclosed |
| CN-102272675-A | A photoresist image-forming process using double patterning | — | 2011-12-07 | — | — | CN | disclosed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | disclosed |
| US-7923200-B2 | Polyvinylcaprolactam based; for production of microelectronics | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-04-12 | — | — | US | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| EP-2158277-A2 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM | AZ Electronic Materials USA Corp. (US) | 2010-03-03 | — | — | EP | disclosed |
| CN-101657511-A | The composition that contains lactan that is used on the photo-resist pattern, applying | AZ ELECTRONIC MATERIALS USA US | 2010-02-24 | — | — | CN | disclosed |
| WO-2008122884-A2 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-10-16 | — | — | WO | disclosed |
| US-20080248427-A1 | Composition for Coating over a Photoresist Pattern Comprising a Lactam | MERCK PATENT GMBH (DE) | 2008-10-09 | — | — | US | disclosed |