Acrylic Acid

Acrylic Acid

SCHEMBL8675807

C=CC(=O)O.O=C(OC(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.56

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKT1 P31749 1/20 0.56
LMNA P02545 3/20 0.54
F2 P00734 1/20 0.54
TSHR P16473 4/20 0.50
KMT2A Q03164 4/20 0.47
MAPT P10636 3/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
TDP1 Q9NUW8 5/20 0.45
TP53 P04637 1/20 0.45
PLA2G7 Q13093 1/20 0.44
MEN1 O00255 1/20 0.44
ALDH1A1 P00352 5/20 0.44
MAPK1 P28482 2/20 0.44
HIF1A Q16665 1/20 0.44
POLB P06746 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A3 Q01959 1/20 0.44
HSD17B10 Q99714 1/20 0.42
DAO P14920 1/20 0.42
NAPRT Q6XQN6 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoyl Peroxide SCHEMBL27795644 0.87 LMNA (0.74) AKT1LMNAF2TSHRKMT2A
Hydrogen Peroxide SCHEMBL27952375 0.86 LMNA (0.70) LMNAF2TSHRKMT2AMAPT
Benzene SCHEMBL27793442 0.86 LMNA (0.70) LMNAF2TSHRKMT2AMAPT
SCHEMBL52413 0.86 LMNA (0.70) LMNAF2TSHRKMT2AMAPT
SCHEMBL1053277 0.85 AKT1 (0.54) AKT1LMNAF2TSHRKMT2A
Acrylic Acid SCHEMBL11292486 0.85 AKT1 (0.54) AKT1LMNAF2TSHRKMT2A
Formaldehyde SCHEMBL28306949 0.84 LMNA (0.61) AKT1LMNAF2TSHRKMT2A
Phosphine SCHEMBL9591710 0.84 LMNA (0.67) LMNAF2TSHRKMT2AMAPT
SCHEMBL1534569 0.84 LMNA (0.67) LMNAF2TSHRKMT2AMAPT
SCHEMBL7050451 0.84 LMNA (0.67) LMNAF2TSHRKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102608867-B Photosensitive water developing corrosion-resistant composition and photosensitive water developing corrosion-resistant dry film HUIZHOU LIANDA ELECTRONIC MATERIAL CO LTD 2014-04-02 CN disclosed
US-5837746-A Coreactive photoinitiators CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-11-17 US disclosed
US-5744512-A Coreactive photoinitiators CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-04-28 US disclosed
US-5532112-A PHOTOPOLYMERIZATION CIBA-GEIGY CORPORATION (US) 1996-07-02 US disclosed
US-4922004-A Copolymerizable photoinitiators Merck Patent Gesellschaft mit bescrankter Haftung (DE) 1990-05-01 US disclosed
US-4721734-A PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1988-01-26 US disclosed
US-4477681-A PHOTOPOLYMERIZATION AND HARDENING OF PRINTING DYES MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1984-10-16 US disclosed
US-4347111-A PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS, HARDENING OF PRINTING DYES MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1982-08-31 US disclosed