⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Perchlorate SCHEMBL2682764 | 0.80 | — | — | |
| Perchlorate SCHEMBL869954 | 0.80 | — | — | |
| Perchlorate SCHEMBL5022933 | 0.80 | — | — | |
| Perchlorate SCHEMBL723927 | 0.80 | — | — | |
| Perchlorate SCHEMBL5942200 | 0.80 | — | — | |
| Perchlorate SCHEMBL159052 | 0.80 | — | — | |
| Perchlorate SCHEMBL4344944 | 0.80 | — | — | |
| Perchlorate SCHEMBL11490710 | 0.80 | — | — | |
| Perchlorate SCHEMBL270105 | 0.80 | — | — | |
| Perchlorate SCHEMBL135770 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116469597-A | Method for treating uranium-containing washing wastewater by using natural modified fibers | 西南科技大学 | 2023-07-21 | — | — | CN | claimed |
| US-9678430-B2 | Composition and process for stripping photoresist from a surface including titanium nitride | ENTEGRIS, INC. (US) | 2017-06-13 | — | — | US | claimed |
| US-20150168843-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ENTEGRIS, INC. (US) | 2015-06-18 | — | — | US | claimed |
| EP-2850495-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | Entegris, Inc. (US) | 2015-03-25 | — | — | EP | claimed |
| US-20140187460-A1 | REMOVAL OF MASKING MATERIAL | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2014-07-03 | — | — | US | claimed |
| US-8618036-B2 | Aqueous cerium-containing solution having an extended bath lifetime for removing mask material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-31 | — | — | US | claimed |
| WO-2013173738-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-11-21 | — | — | WO | claimed |
| US-20130143397-A1 | USE OF AN ORGANIC PLANARIZING MASK FOR CUTTING A PLURALITY OF GATE LINES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-06 | — | — | US | claimed |
| US-8455366-B1 | Use of an organic planarizing mask for cutting a plurality of gate lines | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-04 | — | — | US | claimed |
| US-20130123159-A1 | AQUEOUS CERIUM-CONTAINING SOLUTION HAVING AN EXTENDED BATH LIFETIME FOR REMOVING MASK MATERIAL | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-05-16 | — | — | US | claimed |
| US-8367556-B1 | Use of an organic planarizing mask for cutting a plurality of gate lines | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-05 | — | — | US | claimed |
| EP-2510538-A2 | REMOVAL OF MASKING MATERIAL | Advanced Technology Materials, Inc. (US) | 2012-10-17 | — | — | EP | claimed |
| US-20110140181-A1 | Removal of Masking Material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-06-16 | — | — | US | claimed |
| WO-2011072188-A2 | REMOVAL OF MASKING MATERIAL | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-06-16 | — | — | WO | claimed |
| US-7291217-B2 | Non-toxic corrosion-protection pigments based on rare earth elements | UNIVERSITY OF DAYTON (US) | 2007-11-06 | — | — | US | claimed |
| US-20040104377-A1 | Non-toxic corrosion-protection pigments based on rare earth elements | UNIVERSITY OF DAYTON | 2004-06-03 | — | — | US | claimed |
| US-20040020568-A1 | Non-toxic corrosion-protection conversion coats based on rare earth elements | DAYTON, UNIVERSITY OF | 2004-02-05 | — | — | US | claimed |
| US-20040016910-A1 | Non-toxic corrosion-protection rinses and seals based on rare earth elements | DAYTON, UNIVERSITY OF | 2004-01-29 | — | — | US | claimed |
| US-6248395-B1 | ABRADING SUBSTRATE WITH SLURRY INCLUDING DIAMOND AND CERIUM DIOXIDE PARTICLES, SAID DIAMOND MECHANICALLY ABRADING SAID SUBSTRATE BUT NOT CAUSING CHEMICAL-MECHANICAL POLISHING, SAID CERIUM DIOXIDE CAUSING CHEMICAL-MECHANICAL POLISHING | KOMAG, INC. | 2001-06-19 | — | — | US | claimed |
| US-4234749-A | PRODUCTION OF BENZENE | HYDROCARBON RESEARCH, INC. (US) | 1980-11-18 | — | — | US | claimed |