SCHEMBL871284

SCHEMBL871284

CC[CH][SiH2]O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7584598 0.80
SCHEMBL6064632 0.80
SCHEMBL19894260 0.79
SCHEMBL2806264 0.72
SCHEMBL3682864 0.67
SCHEMBL4609020 0.65
SCHEMBL5077995 0.65
SCHEMBL645821 0.65
SCHEMBL5036721 0.59
SCHEMBL16972735 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120076948-A1 METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed
EP-0781777-A1 Silicon-containing compound and ocular lens material Menicon Co., Ltd. (JP) 1997-07-02 EP disclosed
US-5556929-A FROM UNSATURATED DIESTER WITH URETHANE AND FLUORINE GROUPS AND ACRYLATED SILOXANE, CONTACT LENSES MENICON CO., LTD. (JP) 1996-09-17 US disclosed
EP-0381005-A2 Ocular lens material Menicon Co., Ltd. (JP) 1990-08-08 EP disclosed
EP-0379146-A2 Soft ocular lens material Menicon Co., Ltd. (JP) 1990-07-25 EP disclosed
US-4892402-A PHOTOPOLYMERIZATION SURFACE TREATMENT HOYA CORPORATION (JP) 1990-01-09 US disclosed