SCHEMBL8714161

SCHEMBL8714161

CC(C)(C)OC(=O)NCCCN(CCCNC(=O)OC(C)(C)C)C(=O)OC(C)(C)C

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA14 Q9ULX7 2/20 0.68
TDP1 Q9NUW8 1/20 0.62
MEN1 O00255 1/20 0.54
GAA P10253 1/20 0.54
KMT2A Q03164 1/20 0.54
MAOA P21397 1/20 0.50
MAOB P27338 1/20 0.50
CA1 P00915 9/20 0.48
CA2 P00918 8/20 0.48
CA12 O43570 7/20 0.48
CA9 Q16790 6/20 0.48
STK17B O94768 1/20 0.43
STK17A Q9UEE5 1/20 0.43
EPHX1 P07099 1/20 0.41
HTT P42858 1/20 0.40
DRD2 P14416 2/20 0.40
CKS1B P61024 1/20 0.39
SKP1 P63208 1/20 0.39
SKP2 Q13309 1/20 0.39
CA7 P43166 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8021860 0.97 CA14 (0.68) CA14TDP1MEN1GAAKMT2A
SCHEMBL8719347 0.97 CA14 (0.68) CA14TDP1MEN1GAAKMT2A
SCHEMBL13055400 0.97 CA14 (0.64) CA14TDP1MEN1GAAKMT2A
SCHEMBL13055410 0.97 CA14 (0.68) CA14TDP1MEN1GAAKMT2A
SCHEMBL20491580 0.95 TDP1 (0.66) CA14TDP1MEN1GAAKMT2A
SCHEMBL31329717 0.94 TDP1 (0.69) CA14TDP1MEN1GAAKMT2A
SCHEMBL13055412 0.93 CA14 (0.64) CA14TDP1MEN1GAAKMT2A
SCHEMBL18950461 0.92 CA14 (0.63) CA14TDP1MEN1GAAKMT2A
SCHEMBL9885950 0.92 CA14 (0.63) CA14TDP1MEN1GAAKMT2A
SCHEMBL14540437 0.92 CA14 (0.59) CA14TDP1MEN1GAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8426105-B2 Resist-modifying composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
US-20100297554-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-5834486-A ANTIPROLIFERATIVE, ANTIPROTOZOA AGENTS NOVARTIS AG (CH) 1998-11-10 US disclosed