Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Nitric Acid SCHEMBL4239638 | 1.00 | — | — | |
| Nitric Acid SCHEMBL28965888 | 0.95 | CA5A (0.73) | — | |
| Nitric Acid SCHEMBL27386902 | 0.95 | — | — | |
| Nitric Acid SCHEMBL11505123 | 0.95 | — | — | |
| Nitric Acid SCHEMBL11505124 | 0.95 | — | — | |
| Nitric Acid SCHEMBL1416 | 0.95 | — | — | |
| Nitric Acid SCHEMBL310885 | 0.95 | — | — | |
| Nitric Acid SCHEMBL6034837 | 0.95 | CA5A (0.89) | — | |
| Nitric Acid SCHEMBL11229873 | 0.95 | CA5A (0.89) | — | |
| Nitric Acid SCHEMBL11758696 | 0.95 | CA5A (0.89) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0406859-B1 | Process for producing a resin molded article having a metal plated layer thereon | MITSUI PETROCHEMICAL IND (JP) | 1996-01-10 | — | — | EP | claimed |
| EP-0323685-B1 | PROCESS FOR THE PRODUCTION OF MOLDED ARTICLES HAVING PARTIAL METAL PLATING | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1992-07-01 | — | — | EP | claimed |
| US-5015519-A | Molded article with partial metal plating and a process for producing such article | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1991-05-14 | — | — | US | claimed |
| US-4812275-A | Process for the production of molded articles having partial metal plating | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1989-03-14 | — | — | US | claimed |
| US-4812353-A | Process for the production of circuit board and the like | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1989-03-14 | — | — | US | claimed |
| US-3936331-A | Process for forming sloped topography contact areas between polycrystalline silicon and single-crystal silicon | FAIRCHILD CAMERA AND INSTRUMENT CORPORATION (US) | 1976-02-03 | — | — | US | claimed |
| WO-2024089850-A1 | POLISHING LIQUID, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | 株式会社レゾナック | 2024-05-02 | — | — | WO | disclosed |
| WO-2023174450-A2 | SILICONE MATERIAL, SILICONE TUBE, IMPLANT, PHARMACEUTICAL COMPOSITION, AND TEST METHOD FOR AMOUNT OF DRUG RELEASED | 沈阳星华医药科技有限公司 | 2023-09-21 | — | — | WO | disclosed |
| US-9645262-B2 | Capacitance reduction for pillar structured devices | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) | 2017-05-09 | — | — | US | disclosed |
| US-20160356901-A1 | CAPACITANCE REDUCTION FOR PILLAR STRUCTURED DEVICES | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC | 2016-12-08 | — | — | US | disclosed |
| CN-101803025-B | semiconductor device, process for producing semiconductor device, semiconductor equipment and calculating system of semiconductor equipment | MICRON TECHNOLOGY INC | 2014-07-02 | — | — | CN | disclosed |
| CN-101803025-A | Buried low-resistance metal word lines for cross-point variable-resistance material memories | MICRON TECHNOLOGY INC | 2010-08-11 | — | — | CN | disclosed |
| EP-0374256-B1 | OPTICAL RECORDING MEDIUM AND METHOD OF MANUFACTURING SAME | DAINIPPON PRINTING CO LTD (JP) | 1998-02-25 | — | — | EP | disclosed |
| EP-0374256-A1 | OPTICAL RECORDING MEDIUM AND METHOD OF MANUFACTURING SAME | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1990-06-27 | — | — | EP | disclosed |
| US-4908259-A | Molded article with partial metal plating and a process for producing such article | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1990-03-13 | — | — | US | disclosed |
| EP-0323685-A1 | Process for the production of molded articles having partial metal plating | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1989-07-12 | — | — | EP | disclosed |
| US-4812275-A | Process for the production of molded articles having partial metal plating | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1989-03-14 | — | — | US | disclosed |
| US-4812353-A | Process for the production of circuit board and the like | SANKYO KASEI KABUSHIKI KAISHA (JP) | 1989-03-14 | — | — | US | disclosed |
| EP-0299073-A1 | OPTICAL RECORDING MEDIUM AND PRODUCTION THEREOF | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1989-01-18 | — | — | EP | disclosed |
| US-3936331-A | Process for forming sloped topography contact areas between polycrystalline silicon and single-crystal silicon | FAIRCHILD CAMERA AND INSTRUMENT CORPORATION (US) | 1976-02-03 | — | — | US | disclosed |