Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FOLH1 | Q04609 | 6/20 | 0.45 |
| ▸ | LAP3 | P28838 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | GGH | Q92820 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | GRM3 | Q14832 | 2/20 | 0.34 |
| ▸ | NAALAD2 | Q9Y3Q0 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11689525 | 0.84 | FOLH1 (0.34) | FOLH1LAP3TDP1CA2CA4 | |
| SCHEMBL10875658 | 0.81 | FOLH1 (0.38) | FOLH1TDP1CA2CA4SMN1; SMN2 | |
| SCHEMBL3900935 | 0.81 | FOLH1 (0.42) | FOLH1LAP3CA2GGHGRM3 | |
| SCHEMBL9184937 | 0.80 | FOLH1 (0.38) | FOLH1LAP3TDP1CA2CA4 | |
| SCHEMBL28423960 | 0.79 | FOLH1 (0.41) | FOLH1TDP1CA2CA4SMN1; SMN2 | |
| SCHEMBL4007537 | 0.78 | FOLH1 (0.46) | FOLH1TDP1CA2CA4GGH | |
| SCHEMBL2327068 | 0.75 | FOLH1 (0.48) | FOLH1TDP1CA2CA4SMN1; SMN2 | |
| SCHEMBL1561758 | 0.75 | FOLH1 (0.60) | FOLH1TDP1CA2CA4SMN1; SMN2 | |
| SCHEMBL11688744 | 0.74 | CYP3A4 (0.42) | — | |
| SCHEMBL18042480 | 0.73 | FOLH1 (0.58) | FOLH1TDP1CA2CA4SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 338 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113710761-B | Surface coated abrasive particles for tungsten polishing applications | CMC材料有限责任公司 | 2024-04-09 | — | — | CN | claimed |
| CN-111183195-B | Surface treated abrasive particles for tungsten buffing applications | CMC材料股份有限公司 | 2022-05-10 | — | — | CN | claimed |
| CN-113710761-A | Surface-coated abrasive particles for tungsten buffing applications | CMC材料股份有限公司 | 2021-11-26 | — | — | CN | claimed |
| US-20210198524-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | claimed |
| CN-111183195-A | Surface treated abrasive particles for tungsten buffing applications | 嘉柏微电子材料股份公司 | 2020-05-19 | — | — | CN | claimed |
| US-20180371293-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2018-12-27 | — | — | US | claimed |
| EP-3263687-A1 | ANTIMICROBIAL HARD SURFACE CLEANING COMPOSITION | The Procter & Gamble Company (US) | 2018-01-03 | — | — | EP | claimed |
| EP-3263688-A1 | IMPROVED SHINE IN SOFT WATER | The Procter & Gamble Company (US) | 2018-01-03 | — | — | EP | claimed |
| US-9340707-B2 | Polishing composition to be used to polish semiconductor substrate having silicon through electrode structure, and polishing method using polishing composition | FUJIMI INCORPORATED (JP) | 2016-05-17 | — | — | US | claimed |
| US-6503420-B1 | Such as lithium chloride and 2-phosphono-1,2,4-butanetri-carboxylic acid; environmentally friendly; efficient; durability | FMC CORPORATION | 2003-01-07 | — | — | US | claimed |
| WO-1999002767-A1 | A METHOD FOR PRE-FIBRILLATION OF LYOCELL | NOVO NORDISK A/S (DK) | 1999-01-21 | — | — | WO | claimed |
| EP-0728180-B1 | ADDITIVE FOR USE IN GLASS-BOTTLE WASHING AND ITS USE IN DECREASING GLASS CORROSION | HENKEL ECOLAB GMBH & CO OHG (DE) | 1998-08-26 | — | — | EP | claimed |
| US-5562830-A | IN MIXTURE WITH POLYEPOXYSUCCINIC ACID AND A PHOSPHONOCARBOXYLIC ACID | BETZ LABORATORIES, INC. (US) | 1996-10-08 | — | — | US | claimed |
| US-12516276-B2 | Surface treatment composition | FUJIMI INCORPORATED (JP) | 2026-01-06 | — | — | US | disclosed |
| CN-116323842-B | Abrasive composition and polishing method using the same | 山口精研工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| US-12305081-B2 | Polishing composition | JAPAN VAM & POVAL CO., LTD. (JP) | 2025-05-20 | — | — | US | disclosed |
| US-4020101-A | CLEANSING COMPOUNDS | BAYER AKTIENGESELLSCHAFT (DT) | 1977-04-26 | — | — | US | disclosed |
| US-3959168-A | Synergistic sequestering agent compositions | HENKEL & CIE G.M.B.H. (DT) | 1976-05-25 | — | — | US | disclosed |
| US-3959168-A | Synergistic sequestering agent compositions | HENKEL & CIE G.M.B.H. (DT) | 1976-05-25 | — | — | US | disclosed |
| US-3933427-A | Process for preventing corrosion and the formation of scale in water circulating system | BAYER AKTIENGESELLSCHAFT (DT) | 1976-01-20 | — | — | US | disclosed |