Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | APP | P05067 | 4/20 | 0.36 |
| ▸ | CHEK1 | O14757 | 7/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | QDPR | P09417 | 1/20 | 0.32 |
| ▸ | GAK | O14976 | 1/20 | 0.31 |
| ▸ | JAK2 | O60674 | 1/20 | 0.31 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29399235 | 0.70 | ALDH1A1 (1.00) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| SCHEMBL48945 | 0.70 | ALDH1A1 (1.00) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Methane SCHEMBL28975440 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Hydrochloric Acid SCHEMBL30053031 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Hydrochloric Acid SCHEMBL3947578 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Hydrochloric Acid SCHEMBL29494721 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Ammonia Solution, Strong SCHEMBL2259240 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Hydrochloric Acid SCHEMBL30913021 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| Hydrochloric Acid SCHEMBL622811 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 | |
| SCHEMBL27622453 | 0.68 | ALDH1A1 (0.95) | ALDH1A1CYP3A4HSD17B10TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0648796-B1 | Solutions of polyimide-forming substances and their use | SCHENECTADY INT INC (US) | 1998-08-26 | — | — | EP | disclosed |
| US-5493003-A | MIXTURES OF AMINES, AMIDES AND/OR ESTERS OF TETRACARBOXYLIC ACIDS HAVING AMIDO OR ESTER GROUPS SUBSTITUTED WITH CARBOXYL, SULFO, SILYL OR SILOXY GROUPS, ELECTRONICS | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 1996-02-20 | — | — | US | disclosed |
| US-5478917-A | Aromatic polyamines, tetracarboxylic acid amides and esters; smoothness, flexibility | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 1995-12-26 | — | — | US | disclosed |
| US-5474876-A | Carboxyl-containing polymeric precursor of heterocyclic polymer which is stable at high temperatures and soluble in polar solvents, copolymerizable unsaturated tertiary sulfonium salt, photoinitiator, polar aprotic organic solvent | BASF LACKE + FARBEN AG (DE) | 1995-12-12 | — | — | US | disclosed |
| EP-0648796-A1 | Solutions of polyimide-forming substances and their use | BASF Lacke + Farben AG (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0648795-A1 | Solutions of polyimide-forming substances and their use as coating material | BASF Lacke + Farben AG (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0571899-B1 | Radiation-curable mixture and its' use for producing high temperature-resistant relief structures | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| EP-0573866-B1 | Method for forming patterned layers of heat-resistant polycondensates | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| US-5350663-A | Construction of electrical circuits and protective or insulating layers for electronic components | BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) | 1994-09-27 | — | — | US | disclosed |
| EP-0573866-A1 | Method for forming patterned layers of heat-resistant polycondensates | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-15 | — | — | EP | disclosed |
| EP-0571899-A1 | Radiation-curable mixture and its' use for producing high temperature-resistant relief structures | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-01 | — | — | EP | disclosed |