SCHEMBL8727040

SCHEMBL8727040

CC(C)(C)C1CCC(OC(=O)OC(=O)OC2CCC(C(C)(C)C)CC2)CC1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.50
APOBEC3A P31941 1/20 0.49
APOBEC3G Q9HC16 1/20 0.49
HTT P42858 3/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
KDM4E B2RXH2 1/20 0.47
CYP19A1 P11511 1/20 0.46
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
GAA P10253 1/20 0.42
EPHX1 P07099 1/20 0.39
GLA P06280 1/20 0.38
HSD11B1 P28845 1/20 0.38
LIPA P38571 1/20 0.37
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
EPHX2 P34913 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
ALDH1A1 P00352 1/20 0.34
RECQL P46063 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22733771 0.91 MAPT (0.53) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL30317531 0.90 MAPT (0.46) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL975283 0.89 MAPT (0.43) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL1125849 0.88 MAPT (0.42) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL2380073 0.88 MAPT (0.50) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL35809 0.88 MAPT (0.50) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL4631121 0.86 MAPT (0.49) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL4582405 0.86 MAPT (0.49) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL27529787 0.86 MAPT (0.49) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2
SCHEMBL1820747 0.84 MAPT (0.47) MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120059011-A Ethylene-vinyl alcohol resin, preparation method and application thereof 中国石油化工股份有限公司 2025-05-30 CN claimed
CN-119529164-A Thermoplastic acrylic resin slurry for in-situ pultrusion with stable and rapid reaction and preparation method and application thereof 重庆国际复合材料股份有限公司 2025-02-28 CN claimed
US-3985720-A Polymerization of ethylenically unsaturated monomer employing a catalyst system comprising dialkylpyrocarbonate, organic acid anhydride, alkaline reagent and H2 O2 PPG INDUSTRIES, INC. (US) 1976-10-12 US claimed
CN-120059431-A BMC material and preparation method and application thereof 广东威灵电机制造有限公司 2025-05-30 CN disclosed
CN-119751727-A Ethylene-vinyl alcohol copolymer resin composition and preparation method and application thereof 万华化学集团股份有限公司 2025-04-04 CN disclosed
CN-115195217-B Transparent laminated board based on glued membrane 卡里福热师私人有限公司 2024-07-30 CN disclosed
CN-109321157-B Adhesive composition for optical film, adhesive layer for optical film, optical film with adhesive layer, and image display device 日东电工株式会社 2024-03-12 CN disclosed
CN-117025116-A Adhesive film, preparation method thereof and photovoltaic module 晶科能源(义乌)有限公司 2023-11-10 CN disclosed
CN-113748177-B Composition for manufacturing passivation layer and passivation layer using the same 科慕埃弗西有限公司 2023-10-03 CN disclosed
US-11674047-B2 Composition for manufacturing passivation layer and passivation layer using the same THE CHEMOURS COMPANY FC, LLC (US) 2023-06-13 US disclosed
CN-111065697-B Photocrosslinkable fluoropolymer coating compositions and coatings formed therefrom 科慕埃弗西有限公司 2023-04-28 CN disclosed
CN-113748177-A Composition for manufacturing passivation layer and passivation layer using the same 科慕埃弗西有限公司 2021-12-03 CN disclosed
WO-2020159974-A1 COMPOSITION FOR MANUFACTURING PASSIVATION LAYER AND PASSIVATION LAYER USING THE SAME THE CHEMOURS COMPANY FC, LLC (US) 2020-08-06 WO disclosed
US-20200239724-A1 COMPOSITION FOR MANUFACTURING PASSIVATION LAYER AND PASSIVATION LAYER USING THE SAME JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT 2020-07-30 US disclosed
CN-106687863-B Passivation layer comprising photo-crosslinked fluoropolymer 科慕埃弗西有限公司 2020-07-10 CN disclosed
CN-111065697-A Photocrosslinkable fluoropolymer coating compositions and coatings formed therefrom 科慕埃弗西有限公司 2020-04-24 CN disclosed
EP-3543290-A1 COMPOSITION FOR GLASS FIBER-REINFORCED POLYOLEFIN RESIN MATERIALS, GLASS FIBER-REINFORCED POLYOLEFIN RESIN MATERIAL, METHOD FOR PRODUCING SAME, AND COMPOSITE BODY Furukawa Electric Co., Ltd. (JP) 2019-09-25 EP disclosed
US-5811503-A FOR PHOTOCHROMIC ARTICLES, LENSES PPG INDUSTRIES, INC. (US) 1998-09-22 US disclosed
US-3985720-A Polymerization of ethylenically unsaturated monomer employing a catalyst system comprising dialkylpyrocarbonate, organic acid anhydride, alkaline reagent and H2 O2 PPG INDUSTRIES, INC. (US) 1976-10-12 US disclosed
US-3984386-A Polymerization of ethylenically unsaturated monomer with dialkyl pyrocarbonate and hydrogen peroxide PPG INDUSTRIES, INC. (US) 1976-10-05 US disclosed