1,3-Butanediol

1,3-Butanediol

SCHEMBL872873

CC(O)CCO.COC

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,3-Butanediol SCHEMBL227565 0.90
1,3-Butanediol SCHEMBL222874 0.90
1,3-Butanediol SCHEMBL8176 0.90
1,3-Butanediol SCHEMBL3427715 0.90 TDP1 (0.53)
1,3-Butanediol SCHEMBL4324460 0.87 ALDH1A1 (0.35)
1,3-Butanediol SCHEMBL7210975 0.87 TDP1 (0.50)
1,3-Butanediol SCHEMBL8522817 0.87 TDP1 (0.50)
1,3-Butanediol SCHEMBL29153015 0.87
1,3-Butanediol SCHEMBL28766767 0.87
1,3-Butanediol SCHEMBL2587858 0.87 TDP1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250251361-A1 SENSING COMPOSITIONS, METHODS, AND DEVICES FOR THE DETECTION OF MOLECULES USING A NANOPORE DEVICE OXFORD NANOPORE TECH PLC (GB) 2025-08-07 US disclosed
EP-3961676-B1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-01-22 EP disclosed
US-12188899-B2 Sensing compositions, methods, and devices for the detection of molecules using a nanopore device OXFORD NANOPORE TECHNOLOGIES PLC (GB) 2025-01-07 US disclosed
CN-117858791-A Digital embossing manufacturing method 阪田油墨股份有限公司 2024-04-09 CN disclosed
CN-117836378-A Photo-curable ink composition for inkjet printing 阪田油墨股份有限公司 2024-04-05 CN disclosed
CN-117203292-A Electron beam-curable printing ink composition and printed matter obtained by printing the same 阪田油墨股份有限公司 2023-12-08 CN disclosed
EP-3702387-B1 PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE TOKYO OHKA KOGYO CO LTD (JP) 2023-05-10 EP disclosed
US-20220177965-A1 RELATIVE QUANTIFICATION OF GENETIC VARIANTS IN A SAMPLE ONTERA INC. 2022-06-09 US disclosed
EP-3961676-A1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2022-03-02 EP disclosed
CN-111565936-B Pretreatment liquid and ink set 东洋油墨SC控股株式会社 2021-10-26 CN disclosed
CN-100551207-C The manufacture method of the substrate of the method for removing of resin mask layer and tape welding tin projection HARIMA CHEMICALS INC (JP) 2009-10-14 CN disclosed
US-20090087401-A1 DEODORANT COMPOSITION TAKASAGO INTERNATIONAL CORPORATION (JP) 2009-04-02 US disclosed
US-20080085251-A1 even at a neutral to weakly acidic pH; a lactone or lactam having a mercapto group; with thioglycolic acid, thiolactic acid, cysteine, acetylcysteine, cysteamine, acylcysteamine; RESONAC CORPORATION (JP) 2008-04-10 US disclosed
EP-1827370-A1 HAIR PROCESSING AGENT AND METHOD FOR PERMANENT WAVING HAIR Showa Denko K.K. (JP) 2007-09-05 EP disclosed
US-20060165622-A1 Deodorant composition TAKASAGO INTERNATIONAL CORPORATION (JP) 2006-07-27 US disclosed
WO-2006068276-A1 HAIR PROCESSING AGENT AND METHOD FOR PERMANENT WAVING HAIR SHOWA DENKO K.K. (JP) 2006-06-29 WO disclosed
CN-1764350-A Method for removing resin mask layer and method for manufacturing solder bumped substrate HARIMA CHEMICALS INC (JP) 2006-04-26 CN disclosed
EP-1561476-A1 DEODORANT COMPOSITION Takasago International Corporation (JP) 2005-08-10 EP disclosed
US-4079064-A HYDROFORMYLATION OF 2-VINYL-1,3-DIOXANES WITH HYDROGEN AND CARBON MONOXIDE CELANESE CORPORATION (US) 1978-03-14 US disclosed
US-4064145-A Production of tetrahydrofuran CELANESE CORPORATION (US) 1977-12-20 US disclosed