Dimethylamine

Dimethylamine

SCHEMBL8733503

CC(COCCCN)COCCCN.CNC

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.46
ODC1 P11926 1/20 0.35
HTT P42858 1/20 0.34
TLR2 O60603 4/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL635567 0.84 CYP3A4 (0.44) CYP3A4ODC1HTT
SCHEMBL20869934 0.83 CYP3A4 (0.43) CYP3A4ODC1HTT
SCHEMBL12201729 0.82 CYP3A4 (0.55) CYP3A4ODC1HTTTLR2
SCHEMBL14412440 0.80 CYP3A4 (0.44) CYP3A4ODC1HTTTLR2
SCHEMBL13169200 0.80 CYP3A4 (0.44) CYP3A4ODC1HTT
SCHEMBL234207 0.78
SCHEMBL13862526 0.78 HSD17B10 (0.35) CYP3A4HTT
SCHEMBL1277076 0.75 CYP3A4 (0.53) CYP3A4ODC1HTTTLR2
SCHEMBL3016021 0.74
SCHEMBL15732738 0.74 CYP3A4 (0.56) CYP3A4HTTTLR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240375396-A1 PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR FOR RELIEF PRINTING, AND PRINTING PLATE TOYOBO MC CORPORATION (JP) 2024-11-14 US disclosed
EP-4411479-A1 PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE TOYOBO MC Corporation (JP) 2024-08-07 EP disclosed
WO-2023054272-A1 PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE 東洋紡株式会社 2023-04-06 WO disclosed
EP-0470636-B1 A photosensitive resin composition TOYO BOSEKI (JP) 1998-11-18 EP disclosed
US-5204223-A Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor TOYO BOSEKI KABUSHIKI KAISHA (JP) 1993-04-20 US disclosed
EP-0470636-A1 A photosensitive resin composition Toyo Boseki Kabushiki Kaisha (JP) 1992-02-12 EP disclosed