SCHEMBL8734403

SCHEMBL8734403

CCOC([SiH3])(Cl)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5918509 0.80
SCHEMBL28731004 0.75
SCHEMBL12077132 0.73
SCHEMBL3876891 0.72
SCHEMBL7468026 0.72
SCHEMBL142217 0.72
SCHEMBL4733587 0.71
SCHEMBL2580277 0.69
SCHEMBL229354 0.69
Methane SCHEMBL20505387 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9809711-B2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process VERSUM MATERIALS US, LLC (US) 2017-11-07 US claimed
EP-2618364-A2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-24 EP claimed
US-20130180215-A1 CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-18 US claimed
CN-110358445-B Composition for forming water-repellent film and water-repellent film 信越化学工业株式会社 2022-06-17 CN disclosed
US-11118072-B2 Water repellent film-forming composition and water repellent film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-14 US disclosed
EP-3553121-B1 WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM SHINETSU CHEMICAL CO (JP) 2021-06-09 EP disclosed
US-20190315972-A1 WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-17 US disclosed
EP-3553121-A1 WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM Shin-Etsu Chemical Co., Ltd. (JP) 2019-10-16 EP disclosed
US-9809711-B2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process VERSUM MATERIALS US, LLC (US) 2017-11-07 US disclosed
US-9809711-B2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process VERSUM MATERIALS US, LLC (US) 2017-11-07 US disclosed
US-9809711-B2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process VERSUM MATERIALS US, LLC (US) 2017-11-07 US disclosed
US-20130180215-A1 CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-18 US disclosed
US-20130180215-A1 CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-18 US disclosed
US-20130180215-A1 CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-18 US disclosed
EP-0676425-B1 Hydrogenated block copolymer and hydrogenated block copolymer composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1998-09-09 EP disclosed
US-5596041-A HYDROGENATED STAR BRANCHED BLOCK COPOLYMERS OF BUTADIENE FOR IMPACT STRENGTH, HEAT RESISTANCE, STIFFNESS AND MOLDINGS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-01-21 US disclosed
EP-0676425-A1 Hydrogenated block copolymer and hydrogenated block copolymer composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-11 EP disclosed
EP-0209104-B1 INTERMETALLIC COMPOUND QUANTUM CHEMICAL CORPORATION (a Virginia corp.) (US) 1990-10-24 EP disclosed
EP-0209104-A1 Intermetallic compound QUANTUM CHEMICAL CORPORATION (a Virginia corp.) (US) 1987-01-21 EP disclosed
US-4625000-A SULFONATED WITH SILYL HALOSULFONATE THEN CLEAVAGE OF SILYL GROUP UNION CARBIDE CORPORATION (US) 1986-11-25 US disclosed