Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.67 |
| ▸ | MGAM | O43451 | 1/20 | 0.67 |
| ▸ | SI | P14410 | 1/20 | 0.67 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.40 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL282717 | 0.98 | GAA (0.64) | GAAMGAMSIMGAM2ALDH1A1 | |
| Hydrochloric Acid SCHEMBL23092197 | 0.95 | GAA (0.61) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL8277426 | 0.88 | GAA (0.50) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL25086368 | 0.88 | GAA (0.64) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL8281579 | 0.87 | GAA (0.56) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL20976413 | 0.87 | MGAM (0.50) | GAAMGAMSIMGAM2ALDH1A1 | |
| Hydrochloric Acid SCHEMBL10467391 | 0.86 | GAA (0.61) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL4057076 | 0.85 | — | — | |
| SCHEMBL14364093 | 0.83 | ALDH1A1 (0.50) | GAAMGAMSIMGAM2ALDH1A1 | |
| Hydrochloric Acid SCHEMBL4057071 | 0.83 | ALDH1A1 (0.46) | GAAMGAMSIMGAM2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 545 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112684662-B | Black matrix for liquid crystal display device | 尚健 | 2024-12-13 | — | — | CN | claimed |
| CN-113189842-B | Preparation method of color filter | 江苏穿越光电科技有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-117682997-A | Synthesis method of 3-fluoro-4- (1-pyrazole) -benzonitrile derivative | 青岛科技大学 | 2024-03-12 | — | — | CN | claimed |
| CN-116382032-B | High-stability black nano dispersion liquid suitable for LCD photoresist | 万思得新材料科技(中山)有限公司 | 2023-09-22 | — | — | CN | claimed |
| CN-116382032-A | High-stability black nano dispersion liquid suitable for LCD photoresist | 万思得新材料科技(中山)有限公司 | 2023-07-04 | — | — | CN | claimed |
| CN-114573641-B | Iridium complex derivative, preparation method and application thereof | 大连理工大学 | 2023-06-13 | — | — | CN | claimed |
| CN-112180637-B | Color filter and preparation method thereof | 深圳市稻兴实业有限公司 | 2022-08-26 | — | — | CN | claimed |
| CN-114573641-A | Iridium complex derivative, preparation method and application thereof | 大连理工大学 | 2022-06-03 | — | — | CN | claimed |
| CN-111303663-B | Preparation method of oligomer organic dye, color film photoresist and color film filter | TCL华星光电技术有限公司 | 2021-09-24 | — | — | CN | claimed |
| CN-109824833-B | Negative photosensitive polyimide composition and application thereof | 深圳先进技术研究院 | 2021-08-31 | — | — | CN | claimed |
| EP-3037454-B1 | POLYETHER COMPOUND, PREPARATION METHOD AND PHOTORESIST COMPOSITION THEREOF | BOE TECHNOLOGY GROUP CO LTD (CN) | 2019-10-23 | — | — | EP | claimed |
| US-9726975-B2 | Photoresist composition | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2017-08-08 | — | — | US | claimed |
| US-9541833-B2 | Polyether compound, method for preparing same and photoresist composition | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2017-01-10 | — | — | US | claimed |
| EP-3037454-A1 | POLYETHER COMPOUND, PREPARATION METHOD AND PHOTORESIST COMPOSITION THEREOF | BOE Technology Group Co., Ltd. (CN) | 2016-06-29 | — | — | EP | claimed |
| US-20160154305-A1 | POLYETHER COMPOUND, METHOD FOR PREPARING SAME AND PHOTORESIST COMPOSITION | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-06-02 | — | — | US | claimed |
| US-9279037-B2 | Alkaline soluble resin, process for preparing same, and photoresist composition containing same | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-03-08 | — | — | US | claimed |
| US-20150370165-A1 | PHOTORESIST COMPOSITION | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-12-24 | — | — | US | claimed |
| US-20150152210-A1 | ALKALINE SOLUBLE RESIN, PROCESS FOR PREPARING SAME, AND PHOTORESIST COMPOSITION CONTAINING SAME | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-06-04 | — | — | US | claimed |
| EP-1650203-B1 | Process of preparation of benzimidazol-2-yl quinolinone derivatives | NOVARTIS VACCINES & DIAGNOSTIC (US) | 2008-02-20 | — | — | EP | claimed |
| EP-1650203-A1 | Process of preparation of benzimidazol-2-yl quinolinone derivatives | CHIRON CORPORATION (US) | 2006-04-26 | — | — | EP | claimed |