SCHEMBL8734601

SCHEMBL8734601

C[Si](C)(C)O[Si](CCCN1C(=O)C=CC1=O)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 10/20 0.52
FAAH O00519 5/20 0.52
ALDH1A1 P00352 2/20 0.50
LMNA P02545 2/20 0.50
MAPT P10636 2/20 0.50
NPSR1 Q6W5P4 2/20 0.50
HSP90AA1 P07900 1/20 0.50
TLR9 Q9NR96 1/20 0.50
TP53 P04637 1/20 0.50
PKM P14618 1/20 0.50
HPGD P15428 1/20 0.50
XBP1 P17861 1/20 0.50
MAPK1 P28482 1/20 0.50
HTT P42858 1/20 0.50
RECQL P46063 1/20 0.50
RAB9A P51151 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
GPR35 Q9HC97 1/20 0.50
GPR55 Q9Y2T6 1/20 0.50
PTGS1 P23219 7/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15483452 0.82 MGLL (0.44) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL296687 0.81 MGLL (0.56) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL15483457 0.81 MGLL (0.56) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL16090103 0.80 MGLL (0.46) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL8735944 0.79 MGLL (0.62) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL15834902 0.79 MGLL (0.52) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL638714 0.79 MGLL (0.52) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL19089770 0.76 MGLL (0.54) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL17694103 0.76 MGLL (0.48) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL18227307 0.76 MGLL (0.58) MGLLFAAHALDH1A1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9482950-B2 Curable composition for imprints, pattern-forming method and pattern FUJIFILM CORPORATION (JP) 2016-11-01 US disclosed
US-9482950-B2 Curable composition for imprints, pattern-forming method and pattern FUJIFILM CORPORATION (JP) 2016-11-01 US disclosed
US-20140050900-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERN-FORMING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140050900-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERN-FORMING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
EP-0722959-B1 Highly oxygen-permeable heat-resistant material MENICON CO LTD (JP) 1998-04-08 EP disclosed
EP-0560620-B1 Maleimide polymers and contact lenses from such polymers TORAY INDUSTRIES (JP) 1997-07-16 EP disclosed
US-5587445-A Highly oxygen-permeable heat-resistant material MENICON CO., LTD. (JP) 1996-12-24 US disclosed
EP-0722959-A2 Highly oxygen-permeable heat-resistant material Menicon Co., Ltd. (JP) 1996-07-24 EP disclosed
US-5393803-A Maleimide polymers and contact lenses from such polymers KAWANO TEIJI (JP) 1995-02-28 US disclosed
EP-0560620-A1 Maleimide polymers and contact lenses from such polymers TORAY INDUSTRIES, INC. (JP) 1993-09-15 EP disclosed