Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPBAR1 | Q8TDU6 | 5/20 | 0.80 |
| ▸ | VDR | P11473 | 4/20 | 0.80 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.80 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.80 |
| ▸ | EPHA2 | P29317 | 4/20 | 0.74 |
| ▸ | CASP7 | P55210 | 3/20 | 0.74 |
| ▸ | TP53 | P04637 | 2/20 | 0.74 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.74 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.74 |
| ▸ | BLM | P54132 | 2/20 | 0.74 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.74 |
| ▸ | USP2 | O75604 | 2/20 | 0.74 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.74 |
| ▸ | MDM4 | O15151 | 1/20 | 0.74 |
| ▸ | MAPT | P10636 | 1/20 | 0.74 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.74 |
| ▸ | TSHR | P16473 | 1/20 | 0.74 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.74 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.74 |
| ▸ | BRCA1 | P38398 | 1/20 | 0.74 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22871867 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL135562 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL18575950 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL135561 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL18576232 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL13655500 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL4759767 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL22871996 | 1.00 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL19497261 | 0.94 | GPBAR1 (0.73) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL16344344 | 0.94 | GPBAR1 (0.73) | GPBAR1VDRHIF1ACYP2C9EPHA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2356517-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9217919-B2 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | FUJIFILM CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-9217919-B2 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | FUJIFILM CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-9152048-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9152048-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9046773-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9046773-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-8975002-B2 | Positive resist composition for immersion exposure and pattern forming method | FUJIFILM CORPORATION (JP) | 2015-03-10 | — | — | US | disclosed |
| WO-2010114107-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| WO-2010067898-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| WO-2010067905-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| US-7695892-B2 | Resist composition and pattern-forming method using same | FUJIFILM CORPORATION (JP) | 2010-04-13 | — | — | US | disclosed |
| US-7695892-B2 | Resist composition and pattern-forming method using same | FUJIFILM CORPORATION (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20090246695-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20080241737-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241737-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |