SCHEMBL8738683

SCHEMBL8738683

CON1C(C)(C)CC(C#N)CC1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17586690 0.78
SCHEMBL13008645 0.78
SCHEMBL3454386 0.76
SCHEMBL1433912 0.73 GAA (0.43)
SCHEMBL1433911 0.73 CYP11B2 (0.30)
SCHEMBL9926862 0.72
Hydrochloric Acid SCHEMBL4555800 0.71 GAA (0.41)
SCHEMBL565511 0.70 GAA (0.34)
SCHEMBL19562862 0.70
SCHEMBL7485935 0.70 TSHR (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11248114-B2 Modified heterophasic polyolefin composition MILLIKEN & COMPANY (US) 2022-02-15 US disclosed
US-20220021031-A1 ELECTROLYTE ADDITIVE, ELECTROLYTE, LITHIUM ION SECONDARY BATTERY CONTAINING THE SAME AND USE THEREOF MURATA MANUFACTURING CO., LTD. (JP) 2022-01-20 US disclosed
US-10663864-B2 Pattern forming method, method for manufacturing electronic device, and laminate FUJIFILM CORPORATION (JP) 2020-05-26 US disclosed
US-20180181003-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE FUJIFILM CORPORATION (JP) 2018-06-28 US disclosed
US-20180181003-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE FUJIFILM CORPORATION (JP) 2018-06-28 US disclosed
WO-2012068589-A2 MODULATORS OF METHYL MODIFYING ENZYMES, COMPOSITIONS AND USES THEREOF CONSTELLATION PHARMACEUTICALS (US) 2012-05-24 WO disclosed