Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.61 |
| ▸ | TSHR | P16473 | 1/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.56 |
| ▸ | NPC1 | O15118 | 2/20 | 0.56 |
| ▸ | RAB9A | P51151 | 2/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.55 |
| ▸ | MAPT | P10636 | 6/20 | 0.46 |
| ▸ | LMNA | P02545 | 4/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.46 |
| ▸ | ELANE | P08246 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 5/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | APEX1 | P27695 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | CASP6 | P55212 | 1/20 | 0.44 |
| ▸ | PTPRC | P08575 | 3/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11318929 | 0.86 | ALDH1A1 (0.68) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL9490419 | 0.82 | ALDH1A1 (0.58) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL10355812 | 0.80 | ALDH1A1 (0.67) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL9490907 | 0.79 | ALDH1A1 (0.58) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL155146 | 0.78 | ALDH1A1 (0.69) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL9192176 | 0.77 | SMN1; SMN2 (0.72) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| Nitric Acid SCHEMBL11884408 | 0.77 | ALDH1A1 (0.63) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL10355745 | 0.76 | ALDH1A1 (0.67) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL27987835 | 0.76 | ALDH1A1 (0.67) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 | |
| SCHEMBL3276062 | 0.76 | ALDH1A1 (1.00) | ALDH1A1CYP3A4TSHRSMN1; SMN2NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0155231-B2 | Image-producing process | CIBA GEIGY AG (CH) | 1997-01-15 | — | — | EP | disclosed |
| US-5508141-A | AQUEOUS ACIDIC PHOTORESIST EMULSION CONTAINING RESIN, POSITIVE-ACTING PHOTOACTIVE FUNCTIONALITY, ACID, OXIDIZING AGENT, SURFACTANT | W. R. GRACE & CO.-CONN. (US) | 1996-04-16 | — | — | US | disclosed |
| CN-1030739-C | Method for selectively coating metal surface, method for forming circuit pattern from metal surface and photosensitive emulsion used therefor | GRACE W R & CO (US) | 1996-01-17 | — | — | CN | disclosed |
| EP-0468002-A4 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | GRACE W R & CO (US) | 1995-08-09 | — | — | EP | disclosed |
| US-5232815-A | Corrosion resistance | W. R. GRACE & CO.-CONN. (US) | 1993-08-03 | — | — | US | disclosed |
| EP-0518453-A1 | A method of making electrical circuit traces | W.R. Grace & Co.-Conn. (US) | 1992-12-16 | — | — | EP | disclosed |
| EP-0468002-A1 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | W.R. GRACE & CO.-CONN. (US) | 1992-01-29 | — | — | EP | disclosed |
| US-5064746-A | RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1991-11-12 | — | — | US | disclosed |
| CN-1054836-A | Automatic deposition emulsion and the method for the metal surface being carried out selective protection with this emulsion | GRACE W R & CO (US) | 1991-09-25 | — | — | CN | disclosed |
| WO-1991008840-A1 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | W.R. GRACE & CO.-CONN. (US) | 1991-06-27 | — | — | WO | disclosed |
| US-4822866-A | PLASMA RESISTANT PHOTORESISTS; REMOVABLE WITH WEAK ALKALINE SOLUTIONS | BASF AKTIENGESELLSCHAFT (DE) | 1989-04-18 | — | — | US | disclosed |
| US-4812542-A | PHOTORESISTS, LIGHT-SENSITIVE COATINGS | BASF AKTIENGESELLSCHAFT (DE) | 1989-03-14 | — | — | US | disclosed |
| US-4808682-A | BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND | BASF AKTIENGESELLSCHAFT (DE) | 1989-02-28 | — | — | US | disclosed |
| US-4632900-A | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface | CIBA-GEIGY CORPORATION (US) | 1986-12-30 | — | — | US | disclosed |
| EP-0155231-A2 | Image-producing process | CIBA-GEIGY AG (CH) | 1985-09-18 | — | — | EP | disclosed |