Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.52 |
| ▸ | BLM | P54132 | 2/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | RECQL | P46063 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 2/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | PARP1 | P09874 | 1/20 | 0.52 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | F2 | P00734 | 2/20 | 0.46 |
| ▸ | F10 | P00742 | 1/20 | 0.46 |
| ▸ | F12 | P00748 | 1/20 | 0.46 |
| ▸ | F7 | P08709 | 1/20 | 0.46 |
| ▸ | F3 | P13726 | 1/20 | 0.46 |
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | CES1 | P23141 | 4/20 | 0.43 |
| ▸ | CES2 | O00748 | 3/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzamide SCHEMBL7094288 | 0.74 | PARP1 (0.84) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL27949627 | 0.74 | POLB (0.52) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL5171285 | 0.74 | TDP1 (0.52) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL535862 | 0.72 | CES1 (0.48) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL144974 | 0.70 | CES1 (0.52) | TDP1BLMTSHRRECQLPOLB | |
| Benzamide SCHEMBL28067624 | 0.70 | PARP1 (0.76) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL11474267 | 0.70 | TDP1 (0.42) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL262668 | 0.70 | CES1 (0.40) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL262667 | 0.70 | CES1 (0.40) | TDP1BLMTSHRRECQLPOLB | |
| SCHEMBL145087 | 0.70 | CES1 (0.40) | TDP1BLMTSHRRECQLPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | claimed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | claimed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | claimed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | claimed |
| JP-4194857-A | — | — | None | — | — | JP | disclosed |
| JP-2154262-A | — | — | None | — | — | JP | disclosed |
| JP-2157845-A | — | — | None | — | — | JP | disclosed |
| JP-2154261-A | — | — | None | — | — | JP | disclosed |
| JP-1131205-A | — | — | None | — | — | JP | disclosed |
| EP-0551697-B1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO LTD (JP) | 1997-05-14 | — | — | EP | disclosed |
| EP-0522568-B1 | Photopolymerizable composition and photosensitive lithographic printing plate | NIPPON PAINT CO LTD (JP) | 1997-02-05 | — | — | EP | disclosed |
| US-5378579-A | Unsaturated monomer, unsaturated carboxylamine free radical initiator, absorber, film-forming polymer | NIPPON PAINT CO., LTD. (JP) | 1995-01-03 | — | — | US | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| JP-H02157845-A | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME | HITACHI CHEM CO LTD | 1990-06-18 | — | — | JP | disclosed |
| JP-H02154261-A | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THIS PHOTOSENSITIVE RESIN COMPOSITION | HITACHI CHEM CO LTD | 1990-06-13 | — | — | JP | disclosed |
| JP-H02154262-A | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THIS PHOTOSENSITIVE RESIN COMPOSITION | HITACHI CHEM CO LTD | 1990-06-13 | — | — | JP | disclosed |
| JP-H01131205-A | PHOTO-POLYMERIZATION INITIATOR AND PHOTO-POLYMERIZABLE COMPOSITION CONTAINING SAME | HITACHI CHEM CO LTD | 1989-05-24 | — | — | JP | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |