SCHEMBL87497

SCHEMBL87497

CC(=CC(F)(F)C(F)CC(F)(F)F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31207809 0.83
SCHEMBL8165230 0.83
SCHEMBL532589 0.82
Fluorene SCHEMBL28577133 0.81 SRD5A2 (0.36)
SCHEMBL3792608 0.78
SCHEMBL10429457 0.78 PTGS1 (0.30)
SCHEMBL1737391 0.78 PTGS1 (0.30)
SCHEMBL5193769 0.77
SCHEMBL1859290 0.76
SCHEMBL6065971 0.75 APEX1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11554349-B2 Nanofiber membrane and method for manufacturing the same GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2023-01-17 US claimed
US-20210354090-A1 NANOFIBER MEMBRANE AND METHOD FOR MANUFACTURING THE SAME GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2021-11-18 US claimed
EP-2217740-B1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS EASTMAN KODAK CO (US) 2014-02-26 EP claimed
US-8030212-B2 Process for selective area deposition of inorganic materials EASTMAN KODAK COMPANY (US) 2011-10-04 US claimed
WO-2010096024-A1 AMPHIPHILIC BLOCK COPOLYMER FOR ANTIFOULING COATING AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2010-08-26 WO claimed
EP-2217740-A1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS Eastman Kodak Company (US) 2010-08-18 EP claimed
US-20100078598-A1 CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING ELPANI CO., LTD. (KR) 2010-04-01 US claimed
WO-2009042046-A1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS EASTMAN KODAK COMPANY (US) 2009-04-02 WO claimed
US-20090081827-A1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS BANK OF AMERICA, N.A., AS AGENT 2009-03-26 US claimed
EP-1714195-A2 ORMOSIL AEROGELS CONTAINING SILICON BONDED POLYMETHACRYLATE Aspen Aerogels Inc. (US) 2006-10-25 EP claimed
US-5084537-A Contact lenses from organosilicon monomers that are oxygen permeable BAUSCH & LOMB, INCORPORATED (US) 1992-01-28 US claimed
US-5002979-A Hyydrogenorganosilicon monomer, organosilicon, fluoroorgano monomer, a hydrophobic monomer and a crosslinking agent BAUSCH & LOMB INCORPORATED (US) 1991-03-26 US claimed
EP-0211067-B1 OXYGEN-PERMEABLE LENSES Bausch &amp; Lomb Incorporated (US) 1991-03-13 EP claimed
EP-0216074-A2 Polyvinyl alcohol derivatives and crosslinked hydrogel contact lenses made therefrom CIBA-GEIGY AG (CH) 1987-04-01 EP claimed
EP-0211067-A1 OXYGEN-PERMEABLE LENSES. BAUSCH & LOMB (US) 1987-02-25 EP claimed
EP-0209597-A1 EXTENDED-WEAR LENSES Bausch &amp; Lomb Incorporated (US) 1987-01-28 EP claimed
EP-0061350-B1 METHOD OF FORMING PATTERN Hitachi, Ltd. (JP) 1986-09-17 EP claimed
WO-1986004342-A1 OXYGEN-PERMEABLE LENSES BAUSCH AND LOMB INCORPORATED (US) 1986-07-31 WO claimed
WO-1986004343-A1 EXTENDED-WEAR LENSES BAUSCH AND LOMB INCORPORATED (US) 1986-07-31 WO claimed
US-4430400-A EXPOSED FILTER BASE IS DEVELOPED, DYED, WETTED HITACHI, LTD. (JP) 1984-02-07 US claimed