SCHEMBL532589

SCHEMBL532589

CC(=CC(F)(F)C(F)(F)C(F)CC(F)(F)F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3792608 0.89
SCHEMBL5193769 0.87
Acrylic Acid SCHEMBL30782972 0.82
SCHEMBL87497 0.82
SCHEMBL262653 0.81 CHRM1 (0.31)
SCHEMBL4866043 0.80
SCHEMBL225151 0.80
SCHEMBL3417525 0.78
SCHEMBL3417523 0.78
SCHEMBL31288976 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 276 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7875285-B1 n acrylic ester polymer including a drug having anovercoating of a different acrylic ester polymer having a glass transition temperature of 35-50 degrees C. to control elution of the drug; temperature change morphology of drug polymer to change and increase release; thrombolytic agents; restenosis ADVANCED CARDIOVASCULAR SYSTEMS, INC. (US) 2011-01-25 US claimed
EP-0588534-B1 Radiation curing ink HAYAKAWA RUBBER (JP) 1998-12-02 EP claimed
EP-0588533-B1 Printed thermoplastic resin products and method for printing such products HAYAKAWA RUBBER (JP) 1998-08-12 EP claimed
EP-0338656-B1 Polymeric silicone-based materials with high oxygen permeability BAUSCH & LOMB (US) 1994-03-02 EP claimed
EP-0338656-A2 Polymeric silicone-based materials with high oxygen permeability BAUSCH &amp; LOMB INCORPORATED (US) 1989-10-25 EP claimed
US-4810764-A CONTACT LENSES BAUSCH & LOMB INCORPORATED (US) 1989-03-07 US claimed
EP-3216838-B1 COMPOSITE SYSTEM WITH MASKING MATERIAL HAVING LOW ADHESION TESA SE (DE) 2026-04-01 EP disclosed
WO-2026047156-A1 POLY(METH)ACRYLATES, PRESSURE-SENSITIVE ADHESIVE COMPOUNDS, AND METHOD FOR THE PRODUCTION THEREOF TESA SE (DE) 2026-03-05 WO disclosed
EP-4688433-A1 FIRE PROTECTION LAMINATE TESA SE (DE) 2026-02-11 EP disclosed
EP-4663714-A1 ADHESIVE MATERIAL, ADHESIVE TAPE, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE TESA SE (DE) 2025-12-17 EP disclosed
EP-3943283-B1 STAMPED PIECE, IN PARTICULAR FOR PERMANENT CLOSURE OF HOLES TESA SE (DE) 2025-09-03 EP disclosed
EP-4592370-A1 ADHESIVE TAPE, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING BONDED COMPOSITE TESA SE (DE) 2025-07-30 EP disclosed
EP-4377080-B1 PUNCHED ARTICLE, IN PARTICULAR FOR PERMANENTLY CLOSING HOLES TESA SE (DE) 2025-05-28 EP disclosed
US-4910277-A Blend of polysiloxane and an interior wetting agent BAUSCH & LOMB INCORPORATED 1990-03-20 US disclosed
EP-0338656-A2 Polymeric silicone-based materials with high oxygen permeability BAUSCH &amp; LOMB INCORPORATED (US) 1989-10-25 EP disclosed
EP-0328340-A2 Hydrophilic oxygen permeable polymers BAUSCH &amp; LOMB INCORPORATED (US) 1989-08-16 EP disclosed
US-4847653-A AMORPHOUS CARBON FILM CONTAINING FLUORINE AND HYDROGEN; FRICTION RESISTANCE, IMAGE QUALITY MINOLTA CAMERA KABUSHIKI KAISHA (JP) 1989-07-11 US disclosed
US-4810764-A CONTACT LENSES BAUSCH & LOMB INCORPORATED (US) 1989-03-07 US disclosed
EP-0253279-A2 Photosensitive member comprising charge generating layer and charge transporting layer Minolta Camera Kabushiki Kaisha (JP) 1988-01-20 EP disclosed
US-4292029-A APPLYING FLUOROPOLYMER OR MONOMERS TO SURFACE UNIVERSITY OF MICHIGAN (US) 1981-09-29 US disclosed