Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.40 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.40 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 4/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 4/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 4/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.38 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.38 |
| ▸ | HTR2A | P28223 | 2/20 | 0.38 |
| ▸ | HTR2C | P28335 | 2/20 | 0.38 |
| ▸ | HRH1 | P35367 | 2/20 | 0.38 |
| ▸ | OPRM1 | P35372 | 2/20 | 0.38 |
| ▸ | DRD3 | P35462 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36373 | 0.89 | LMNA (0.50) | LMNATAAR1TRPA1SLC7A5SLC6A4 | |
| SCHEMBL18399891 | 0.83 | LMNA (0.42) | LMNATAAR1TRPA1SLC7A5SLC6A4 | |
| SCHEMBL15520297 | 0.83 | LMNA (0.42) | LMNATAAR1TRPA1SLC7A5SLC6A4 | |
| SCHEMBL20866401 | 0.83 | AOC3 (0.41) | LMNATAAR1SLC7A5SLC6A4KMT2A | |
| SCHEMBL16400827 | 0.81 | TAAR1 (0.39) | LMNATAAR1TRPA1SLC6A4KMT2A | |
| SCHEMBL14935978 | 0.81 | GSR (0.50) | LMNATAAR1TRPA1BLM | |
| SCHEMBL16398170 | 0.81 | GSR (0.50) | LMNATAAR1TRPA1BLM | |
| SCHEMBL8750611 | 0.81 | CHRNA7 (0.40) | LMNASLC6A4KMT2AMEN1CYP1A2 | |
| SCHEMBL12525111 | 0.81 | TAAR1 (0.39) | LMNATAAR1TRPA1SLC6A4CYP3A4 | |
| SCHEMBL14268236 | 0.81 | TAAR1 (0.54) | TAAR1SLC7A5SLC6A4SLC6A2SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10889677-B2 | Compositions and process for stabilizing phenolic resins containing calixarenes | SI GROUP, INC. (US) | 2021-01-12 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9527809-B2 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9519214-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-13 | — | — | US | disclosed |
| US-9470980-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2016-10-18 | — | — | US | disclosed |
| US-20160291461-A1 | PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD | FUJIFILM CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| EP-0523697-B1 | Color-developing compositions and their use | MITSUI TOATSU CHEMICALS (JP) | 1997-04-02 | — | — | EP | disclosed |
| EP-0268878-B1 | Salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal salts of the copolymers and color-developing sheets employing the agents | MITSUI TOATSU CHEMICALS (JP) | 1996-01-31 | — | — | EP | disclosed |
| US-5447901-A | Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid | MITSUI TOATSU CHEMICAL, INC. (JP) | 1995-09-05 | — | — | US | disclosed |
| US-5376615-A | Pressure sensitive elements containing a salicylic acid resin and a phenolic resin | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1994-12-27 | — | — | US | disclosed |
| EP-0523697-A1 | Color-developing compositions and their use | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-01-20 | — | — | EP | disclosed |
| CN-1016432-B | Salicylic acid copolymer and method for preparing metal salt thereof | MITSUI TOATSU CHEMICAIS INC (JP) | 1992-04-29 | — | — | CN | disclosed |
| US-5023366-A | Reacted with a benzyl halide, alcohol or ether; for pressure sensitive elements | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1991-06-11 | — | — | US | disclosed |
| CN-1051368-A | Salicylic acid copolymers and its metal-salt and preparation method thereof contain the developer of this metal salts of copolymers and the colour developing paper of this developer of employing | MITSUI TOATSU CHEMICALS (JP) | 1991-05-15 | — | — | CN | disclosed |
| CN-87107802-A | Salicylic acid copolymer and metal salt thereof, process for producing the same, color-developing agent containing the copolymer metal salt, and color-developing paper using the color-developing agent | — | 1988-08-10 | — | — | CN | disclosed |
| EP-0268878-A2 | Salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal salts of the copolymers and color-developing sheets employing the agents | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1988-06-01 | — | — | EP | disclosed |