SCHEMBL8750487

SCHEMBL8750487

CCCC(OC(CCC)C(CC)c1ccc(C)cc1)C(CC)c1ccc(C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 5/20 0.39
SLC6A3 Q01959 4/20 0.39
SLC6A2 P23975 3/20 0.39
LMNA P02545 2/20 0.39
CYP1A2 P05177 1/20 0.39
PGR P06401 1/20 0.39
CHRM2 P08172 1/20 0.39
CYP3A4 P08684 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
AR P10275 1/20 0.39
CYP2D6 P10635 1/20 0.39
MAPT P10636 1/20 0.39
CHRM1 P11229 1/20 0.39
CYP2C9 P11712 1/20 0.39
ALOX15 P16050 1/20 0.39
DRD1 P21728 1/20 0.39
TBXA2R P21731 1/20 0.39
PTGS1 P23219 1/20 0.39
CYP2C19 P33261 1/20 0.39
ADRA1A P35348 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8750475 0.83 HKDC1 (0.44) ESR1SLC6A3SLC6A2LMNACYP1A2
SCHEMBL8750582 0.81
SCHEMBL8750508 0.79 CA12 (0.38) ESR1SLC6A3SLC6A2LMNATDP1
SCHEMBL21402278 0.73 TSHR (0.51) LMNACYP3A4
SCHEMBL8750494 0.72 CHRNA7 (0.41) ESR1SLC6A3SLC6A2LMNATDP1
SCHEMBL23188100 0.71 ESR1 (0.48) ESR1SLC6A3SLC6A2LMNACYP1A2
SCHEMBL8750447 0.71 CHRNA7 (0.40) ESR1LMNACYP1A2CYP3A4CYP2D6
SCHEMBL18714383 0.70 ESR1 (0.46) ESR1SLC6A3SLC6A2LMNATDP1
SCHEMBL9789948 0.70 CHRNA7 (0.38) ESR1SLC6A3SLC6A2LMNACYP1A2
SCHEMBL18613186 0.69 ESR1 (0.48) ESR1SLC6A3SLC6A2LMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0523697-B1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS (JP) 1997-04-02 EP disclosed
US-5447901-A Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid MITSUI TOATSU CHEMICAL, INC. (JP) 1995-09-05 US disclosed
US-5376615-A Pressure sensitive elements containing a salicylic acid resin and a phenolic resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1994-12-27 US disclosed
EP-0523697-A1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed