SCHEMBL8763246

SCHEMBL8763246

O=C(OC1CCCCO1)c1ccccc1C(=O)OC1CCCCO1

nearest known ligand 0.46

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 2/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
SLC6A3 Q01959 2/20 0.40
KDM4C Q9H3R0 1/20 0.40
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
ALDH1A1 P00352 2/20 0.38
HPGD P15428 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2574276 0.90 KDM4E (0.40) KDM4ESMN1; SMN2ALDH1A1HSD17B10TDP1
SCHEMBL5697655 0.87 ALDH1A1 (0.51) MEN1KMT2AKDM4EKDM4CNPC1
SCHEMBL30888324 0.87 SCN1A (0.41) MEN1KMT2AKDM4ESMN1; SMN2SLC6A3
SCHEMBL21891519 0.87 KMT2A (0.43) MEN1KMT2ASMN1; SMN2SLC6A3HPGD
SCHEMBL1397227 0.86 KDM4E (0.36) MEN1KMT2AKDM4ESMN1; SMN2SLC6A3
SCHEMBL26645483 0.86 BCHE (0.47) KMT2AKDM4ESMN1; SMN2NPC1RAB9A
SCHEMBL23817377 0.85 SLC18A3 (0.50) MEN1KMT2ASLC6A3HPGD
SCHEMBL6354199 0.83 BCHE (0.40) MEN1KMT2AKDM4ESMN1; SMN2SLC6A3
SCHEMBL21891524 0.82 SMN1; SMN2 (0.43) KDM4ESMN1; SMN2NPC1RAB9AALDH1A1
SCHEMBL8874230 0.82 ITGB1 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5654354-A BLEND OF FILM FORMING POLYMER NAD PLASTICIZER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1997-08-05 US disclosed
EP-0541969-B1 Method for diffusion patterning DU PONT (US) 1997-07-23 EP disclosed
EP-0742585-A1 Method and compositions for diffusion patterning tape on substrate E.I. DU PONT DE NEMOURS AND COMPANY (US) 1996-11-13 EP disclosed
US-5275689-A Solubilizing acid labile polymer by reaction with organic acid E. I. DU PONT DE NEMOURS AND COMPANY (US) 1994-01-04 US disclosed
EP-0541969-A1 Method and compositions for diffusion patterning E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-05-19 EP disclosed
US-5120629-A Mixture of electroconductive substrate, acid labile compound, and photoinitiator E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-06-09 US disclosed
EP-0451741-A2 Positive-working photosensitive electrostatic master E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-10-16 EP disclosed